Abstract
It is shown that two modes of resistive switching – bipolar and volatile unipolar – are peculiar for the Ag/Ge/Si structures with germinating dislocations in the germanium layer. In this modes the structures have stable states of electric current with ION/IOFF ~1.5–2.7. The volatile unipolar type of switching can be caused by the capture of charge carriers to deep levels associated with lattice defects in the Ge film of the memristor. At the same time, bipolar switching is associated with the drift of Ag+ ions along germinating dislocations.
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