Исследование робастности наноэлектронных структур на базе резонансно-туннельных элементов

Abstract

Multi-input logic gates based on two-level logic cells MOBILE have short (picosecond) switching times and higher functionality due to the ability to implement logic functions with fewer gates. This creates good prospects for the development of ultra-high-speed FPGAs with a high degree of integration, which are required for organizing high-performance computing. However, the extremely high sensitivity of resonant tunneling elements to changes in the energies of quantum states requires an assessment of the stability of such structures to external influences in real operation. In this work, the problem of assessing the stability of nanoelectronic structures that include resonant tunneling elements is considered. The method for studying the robustness of logic cells MOBILE based on a resonant tunneling diode and an НВТ transistor was proposed, making it possible to find an external interval estimate of the output voltage of the device under study for given interval models of the initial components. The technique is based on the use of systems of topological and parametric equations written in finite increments. It was shown that the proposed decomposition principle for the initial interval model ensures the algorithmic solvability of the problem posed. A computational algorithm for calculating processes in a two-level logical cell MOBILE has been developed. The algorithm provides for step-by-step integration of interval differential equations and solution of interval nonlinear algebraic equations at each step of integration using Kaucher interval arithmetic. The obtained results of the study of processes in a two-level logic cell MOBILE create prerequisites for expanding the field of application of resonant tunneling devices in high-speed monolithic integrated circuits.