Abstract

From today’s point of view tunneling elements (TE) such as the resonant tunneling diode (RTD) are of fundamental relevance for nanoelectronics. They are usually of nanometric scale in a single dimension and are promising candidates as precursors for future nanoscaled ULSI circuits. At present they are the most mature type of all quantum-effect devices. Compared to single-electron transistors (SET) and more advanced quantum-dot architectures, resonant tunneling devices are already operating at room temperature. Technological advances, such as the development of a III–V large scale integration process, and the demonstration of a Si/Si0.5Ge0.5/Si resonant iuterband tunneling diode, are a challenge for circuit designers to develop digital logic families and memory arrays.

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