Abstract
<TEX>$ZrO_2$</TEX> film was deposited by facing target sputtering (FTS) system on polyethylene naphthalate (PEN) substrate as a gas barrier layer for flexible organic light emitting devices (FOLEDs), In order to control the heat of the FTS system caused by the ion bombardment in the cathode compared with the conventional sputtering system, the process characteristics of the FTS apparatus are investigated under various sputtering conditions such as the distance between two targets (<TEX>$d_{TT}$</TEX>), the distance between the target and the substrate (<TEX>$d_{TS}$</TEX>), and the deposition time. The <TEX>$ZrO_2$</TEX> film by the FTS system can reduce the damage on the films because the ion bombardment with high-energy particles like gamma-electrons, Moreover, the <TEX>$ZrO_2$</TEX> film with optimized condition (<TEX>$d_{TT}$</TEX>=140 mm) as a function of the distance from center to edge showed a very uniform thickness below 5 % for a deposition time of 3 hours, which can improve the interface property between the anode and the plastics substrate for flexible displays, It is concluded that the <TEX>$ZrO_2$</TEX> film prepared by the FTS system can be applied as a gas barrier layer or an interlayer between the anode and the plastic substrate with good properties of an uniform thickness and a low deposition-temperature.
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