Свойства пленок титаната бария-стронция на кремниевой подложке, нанесенных методом высокочастотного катодного распыления

Abstract

AbstractUsing rf cathode sputtering of a target in the oxygen atmosphere, Ba_0.6Sr_0.4TiO_3 solid solution thin films have been formed on the single-crystal Si(001) cut surface and their crystal structure, microstructure, and optical characteristics have been investigated. It is shown that the films are optically anisotropic, polycrystalline, and have a c axis preferred direction perpendicular to the substrate. The a and b axes in the substrate plane have no preferred direction. It has been established that, during the synthesis, a buffer layer with a thickness of about 20 nm forms between the film and substrate, which is optically equivalent to silicon oxide.