Abstract
Submicron tungsten oxide (WO3) layers of 50-250 nm thickness were obtained by magnetron deposition. The resulting films structure was adjusted in the course of magnetron sputtering using a method based on the modulation of electrochromic tungsten oxide (VI) deposition angle developed in our earlier studies. The prepared WO3 layers were used for the manu-facture of electrochromic devices which electrical characteristics were studied by cyclic volt-amper¬ometry using a three-electrode connection scheme. Based on the obtained data, coefficients of Li+ ions diffusion were calculated and found to follow an ex¬treme dependence upon the speed of tungsten oxide deposition angle modulation with a maximum at speed about 1.2 rpm.
Published Version
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