The conditions for manufacturing ZnO:Al and ZnS films by RF magnetron sputtering on the surface of crystalline n-CdTe substrates of isotypic ZnO:Al/ZnS/n-CdTe heterostructures with diode properties were studied. The energy parameters of the barrier in the heterostructure are determined and the model of the energy diagram is proposed. A good agreement of the I-V-characteristics of the structure with the space-charge-limited currents theory was established. On the basis of C-V-characteristics studies of the ZnO:Al/ZnS/n-CdTe heterostructure, characteristic features of the SIS structure (semiconductor-insulator-semiconductor) with a dielectric layer made of a ZnS film and a high-resistance CdSxTe1−x solid solution were revealed. The photosensitivity of ZnO:Al/ZnS/n-CdTe heterostructures in the visible radiation range at reverse biases was investigated.
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