A simultaneous X-ray fluorescence (XRF) and X-ray diffraction (XRD) analysis method for probing the internal depth profile of a material using tungsten target and cadmium telluride (CdTe) detectors is presented. To select a suitable target source, a Geant4 simulation is used to simulate the characteristic X-ray photon numbers produced by metallic materials with atomic numbers ranging from 24 to 92. The fluorescence analysis demonstrates the ability to measure intensity-depth profiles to greater than 500 μm depth in CeO2 powder, at least 400 μm depth in Er2 O3 powder, at least 200 μm depth in WO3 powder and up to 500 μm depth in Bi2 O3 powder. In addition, the diffraction analysis demonstrates the capacity to measure intensity-depth profiles to a depth of greater than 5 mm in silicon powder, at least 2 mm depth in nickel powder and up to 200 μm depth in tungsten powder. This method could be extended to component and phase detection in the safety inspection of flammable and explosive materials.
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