A digital nano-moiré method with wavelet transformation is explored to measure nanoscalein-plane displacement fields. By applying e-beam lithography, a periodic PMMAnanostructure array is fabricated directly on the specimen and used as the specimengrating. Moiré patterns are generated by overlapping the images of the PMMA specimengrating obtained from AFM scanning and the virtual reference grating produced by adigital image generating process. Then, the overlapped images are filtered by the 2Dwavelet transformation (WT) to capture the target moiré patterns. Existing methods, byoverlapping the monitor-generated scanning lines with the image of the specimengrating, cause a mismatch problem. Previously, the carrier moiré method wasexplored with the aim of curing the mismatch problem. Unfortunately, the carriermoiré method, in addition to suffering from increased complexity of mathematicalcalculations, is incapable of directly obtaining the displacement field. Thus, themismatch problem will result in inconveniences and restrictions in the practicalapplication. Instead of using monitor-generated scanning lines, the proposed methodapplies the virtual reference grating, and thus puts the mismatch problem to rest.Nevertheless, the resultant moiré image suffers from low contrast which, if leftuntreated, might distort the measurement result. Therefore, the WT, known for itssharpened abilities of characteristic and edge detection, is used to capture the targetmoiré patterns and improve the measurement accuracy. The proposed method hasbeen carried out in the laboratory. Experimental results have shown that theproposed method is convenient and efficient for nanoscale displacement measurement.