Developments In Moire Interferometry

Abstract

Recent progress in high-sensitivity moire interferometry is reviewed. Interference patterns reveal full-field contour maps of in-plane displacements. Sensitivity corresponds to moire with 1200 lines/mm (30,480 //in.) for most examples, but approaches the theoretical limit of X/2 displacement per fringe in one demonstration. Techniques for producing cross-line phase gratings on specimens are described, as well as use of real and virtual reference gratings. Carrier patterns and optical filtering are used to cancel initial or no-load patterns. Diverse applications are illustrated.