University Of Hyogo Research Articles

Large area and wide dimensions X-ray lithography using energy variable synchrotron radiation

We developed a new X-ray lithography system for the lithographite, galvanoformung and abformung (LIGA) process using synchrotron radiation at the New SUBARU facility of the University of Hyogo. The X-ray lithography system can utilize two different energy regions: one is a high-energy region: from 2 to 12 keV, and the other is a low-energy region from 1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. Large-area patterning across an A4-size area was successfully performed with a highly uniform pattern thickness. Furthermore, high-aspect-ratio patterning using a high-X-ray-energy region was also achieved using this X-ray lithography system.

Fabrication of Spiral Micro-Coil Utilizing LIGA Process

We developed a method for fabricating a three-dimensional spiral micro-inductor with high inductance using the LIGA process. The spiral inductor created had a diameter of 0.5mm, and a length of 1mm. The width of the spiral line was 10µm, the pitch was 20µm, and the number of turns was 15. It was made of plated copper. The master was a brass round bar coated with PMMA resist. Deep X-ray lithography was employed to fabricate a master for a metallic mold at the NewSUBARU synchrotron radiation facility, University of Hyogo. The inductor core was made of resin by injection molding. It has a spiral micro flute on the surface. We chose the worm injection molding technique in order to avoid the parting line across the spiral line. The worm injection molding was the method─for demolding the work such as that used in loosening a screw.

Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation

We developed an x-ray lithography system for the “lithographite, galvanoformung, and abformung” process using synchrotron radiation at the NewSUBARU facility of the University of Hyogo, Hyogo, Japan. The x-ray lithography system can utilize two different energy regions: one is a high-energy region: from 2 to 12 keV, and the other is a low-energy region from 1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. Large-area patterning across an A4-size area was successfully performed with a highly uniform pattern thickness. Furthermore, high-aspect-ratio patterning using a high-x-ray-energy region was also achieved using this x-ray lithography system.