The surface structure of the epitaxial NiSi 2/Si(111) system has been determined applying new ion scattering methods. By detection of backscattered ions with ultrahigh energy resolution the signals from successive atomic layers are separated. Angular distributions of the yield of ions mainly backscattered from a single Ni monolayer directly provide the (sub)surface atom coordinates. In addition, analysis of the energy losses in the first atomic layer, which depend on the specific ion trajectories, allows an independent structure determination. Using either of the two methods, the NiSi 2(111) surface is found to have a bulklike topology, i.e. it is terminated by a SiNiSi triple layer. Other surface structure models, such as termination by a Si double layer, are ruled out. The outermost NiNi and NiSi interlayer spacings are found to be contracted with respect to their bulk values in the strained silicide by 0.05 ± 0.02 and 0.12 ± 0.02 Å, respectively.
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