Arsenic-sulfur glasses can be directly prepared in the film form by thermal evaporation under normal pressure employing an evaporation outfit devised so as to prevent oxidation by atmospheric gas. The prevention of oxidation is made by contacting a plane target of a moderate thickness with the top edge of batch container. The moderate thickness of target is in the neighborhood of 0.05mm when the target material is aluminum.The preparation of transparent glass films requires control of the target temperature. In general, during an evaporation the batch has been heated up to 120°-150°C higher than the target temperature. In the case of As2S3 batch, target temperatures below about 345°C have been resulted in opaque and/or crystalline films whereas at temperatures of 345°-365°C transparent glass films of good quality have been obtained. Target temperatures above about 365°C, however, cause the formation of bubbles in the film. Transparent glass films can be successively obtained by replacing the target during the continuous evaporation. The optimum temperature of target is shifted toward the lowered temperature and at the same time the optimum temperature range is widened with the increase in the sulfur content of batches. In the case of the batch of As2S3+11S in mole ratio, the optimum range of target temperature has been 250°-290°C. The direct preparation of transparent glass films from the batch mixture of arsenic and sulfur can be made by the almost the same temperature control of target as in the case of the batch of As2S3-S system. The rate of deposition of the glass films has been about 0.01mm/min. when the difference in temperature was 120°-150°C between target and batch. When the material of target is aluminum, the dissolution of the target in dilute hydrochloric acid is one of the convenient ways of separating the glass film from the target. In this way, transparent glass films of 0.05-0.3mm thickness have been successfully obtained without special care.The arsenic content of transparent glass films obtained is increased with that of batches, and is increased with raising the target temperature within the optimum range. The arsenic content of the glass films is increased to some extent by the continuous evaporation and successive depositions of the film on new targets. The composition of the films obtained from As2S3 batch has been in the range of about 59 weight% arsenic (As2S3.2) to about 63 weight% arsenic (As2S2.7), and the compostion of the films from As2S3+11S batch in the range of about 23 weight% arsenic (As2S16) to about 37 weight% arsenic (As2S8). In this paper, the arsenic-sulfur mole ratios are expressed in the form of formulas for each glass film.The X-ray diffraction measurements on the transparent films of the compositions near to As2S3 and As2S8 and on the ircrushed powders show that these films are glassy. A few additional properties observed from glass films of the composition ranging from As2S2.7 to As2S8.2 are as follows: Infrared transparent up to about 12μ (transmission=about 70%); no appearance of devitrification after the heat treatment in moist air at about 95°C for 9 hours and/or after the exposure to moist air at room temperature for 1 year; inert to both hot water and 10 weight% hydrochloric acid at about 95°C (weight loss after 9 hours=10-4-10-5g/100g of reagent); high electric resistivity (volume resistivity at room temperature=1015-1016 ohm-cm).