Urea in the ultrapure water production process threatens semiconductor manufacturing. This work proposed a urea removal strategy involving the VUV/UV/chlorine process in an acidic solution to achieve high-efficiency urea removal. VUV/UV/chlorine could thoroughly remove urea of 2 mg/L within 9 min at pH 3. A TN removal rate of 70% and a dissolved organic carbon removal rate of 84% were achieved in the urea degradation process. The decrease in pH and the increase in oxidant dosage could improve urea removal efficiency. The presence of chloride anion could improve urea removal by 55–85%. Based on the radical probe and quenching experiments, free radicals accounted for more than 90% of urea removal. •Cl2− and •OH were calculated to contribute approximately 36% and 22%, respectively, to urea removal. •Cl and •ClO together contributed less than 32%. The chlorination of urea was responsible for less than 10% of urea removal. Nitrogen in urea was transformed efficiently into inorganic nitrogen (N2, ammonium, and nitrate with a rough ratio of 6:1:1.1). Organic chlorine products formed in the urea degradation process took up less than 3% in all chlorine element and was converted into chloride anion finally.
Read full abstract