The influence of water vapour on the oxidation of a technical γ-TiAl based alloy at temperatures of 700 and 750 °C is discussed. The present paper focuses on the oxidation behaviour in dry air and air containing 10 vol.% H 2O with respect to oxidation kinetics and microstructural investigations of the oxide scales and the subsurface zones. The presence of water vapour led to a significant acceleration in the oxidation kinetics as well as to a change in the crystal morphology and microstructure of the oxide scales formed. The results indicate that the kinetics of the reaction of water molecules with the rutile phase and a change in its defect structure are important parameters in the mechanism. The subsurface zone formed in water vapour-containing atmospheres consisted (in addition to the cubic Al-depleted layer) of a lamellar layer of Al 2O 3 and Ti due to either internal oxidation or decomposition of the cubic phase. Both, the oxide scale and the depletion layer are important regarding the mechanical behaviour of a TiAl component at high temperatures which was also investigated.
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