Liquid phase exfoliation of Ti3C2Tx MXene using LiF/HCl mix, forming HF in situ, has been modified by the addition of NH4OH. The base assisted dilution and extraction of MXene enables a quick control over pH and improves the structural, morphological and optical properties of the compound. The formation of a buffer compound NH4F, reduces the oxidation on the surface of MXene and etches off the residual MAX phase, by attacking Al. The structural features of the prepared NH4OH added Ti3C2Tx MXene are remarkably better than the HF etched samples, with the characteristic MXene peak in XRD being emphasized in the former. The addition of ammonia solution improves the milder in situ HF etching technique, by giving the characteristic open accordion structure to the compound, making the compound easy to delaminate and more stable against oxidation in ambient atmosphere.
Read full abstract