Composition and temperature dependence of forced magnetostriction have been measured for rf-sputtered Gd-Fe films using the cantilever capacitance method. Forced magnetostriction varies remarkably with film composition and temperature, and also depends on the substrate bias voltages applied during sputtering. It has been found that the change of forced magnetostriction coincides well with the change of the parameter δ, where δ is amount of fluctuation in the exchange constant between sublattice moment, and it has been evaluated by using Handrich’s modified molecular field theory. Therefore, we conclude that forced magnetostriction of sputtered Gd-Fe films is strongly related to δ.