Abstract
Composition and temperature dependence of forced magnetostriction have been measured for rf-sputtered Gd-Fe films using the cantilever capacitance method. Forced magnetostriction varies remarkably with film composition and temperature, and also depends on the substrate bias voltages applied during sputtering. It has been found that the change of forced magnetostriction coincides well with the change of the parameter δ, where δ is amount of fluctuation in the exchange constant between sublattice moment, and it has been evaluated by using Handrich’s modified molecular field theory. Therefore, we conclude that forced magnetostriction of sputtered Gd-Fe films is strongly related to δ.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
