Abstract TiN layers were prepared by r.f. magnetron sputtering onto polished flat high speed steel surfaces. The rectangular samples were mounted on a special holder, providing a temperature gradient in the range 775-300 K along the length of the sample. The TiN layers were deposited at various total pressures and different ratios of argon pressure to N2 pressure. The samples were fractured along a V-shaped notch. The film morphology was observed by scanning electron microscopy and correlated to mechanical properties such as microhardness and adhesion. The results are discussed with respect to the sputtering conditions.