We have investigated the dependence of the electrical characteristics on the vertical electric fields in InAs/(Al x Ga 1- x )Sb double heterostructures by Hall effect measurements. By measuring the samples with different upper barrier thicknesses, we have observed the mobility modulation in the (AlGa)Sb/InAs/AlSb heterostructures by effectively changing the surface electric field. The mobility modulation is attributed to the modulated scattering probability depending on the electron distribution in the quantum well due to the built-in surface electric field. The proportionality coefficient of the sheet carrier concentration against inverse upper barrier thickness roughly corresponds to the potential difference between the Fermi energy in the InAs quantum well and the surface pinning level of GaSb under flat-band conditions.