Subwavelength Grating Research Articles

Racetrack Ring Resonator-Based on Hybrid Plasmonic Waveguide for Refractive Index Sensing.

In this study, a comprehensive numerical analysis is conducted on a hybrid plasmonic waveguide (HPWG)-based racetrack ring resonator (RTRR) structure, tailored specifically for refractive index sensing applications. The sensor design optimization yields remarkable results, achieving a sensitivity of 275.7 nm/RIU. Subsequently, the boundaries of sensor performance are pushed even further by integrating a subwavelength grating (SWG) structure into the racetrack configuration, thereby augmenting the light-matter interaction. Of particular note is the pivotal role played by the length of the SWG segment in enhancing device sensitivity. It is observed that a significant sensitivity enhancement can be obtained, with values escalating from 377.1 nm/RIU to 477.7 nm/RIU as the SWG segment length increases from 5 µm to 10 µm, respectively. This investigation underscores the immense potential of HPWG in tandem with SWG for notably enhancing the sensitivity of photonic sensors. These findings not only advance the understanding of these structures but also pave the way for the development of highly efficient sensing devices with unprecedented performance capabilities.

Terahertz Magnetic Moiré Grating for Enhanced Chirality Manipulation and Nonreciprocal Spin Isolation

AbstractMagneto‐optical activity is a significant way to achieve asymmetric transmission for spin photons. However, it is severely limited by the weak light‐matter interaction in the terahertz (THz) region. In this work, a magnetic Moiré grating (MMG) is constructed by sandwiching an Yttrium iron garnet (YIG) single crystal in a pair of twisted 2D subwavelength gratings. The twisted angle between two gratings introduces a strong geometric Moiré chirality related to the Moiré pattern. When an external magnetic field is applied to the YIG layer, three different symmetries of spacial mirror image, time reversal, and spin conjugation are broken simultaneously under the chiral coupling between magneto‐optical activity and Moiré chirality, leading to both the enhanced magneto‐optical chiral transmission and the nonreciprocal spin isolation. Under the magnetic field varying from −0.26 to +0.26 T in the experiment, the MMG achieves an active modulation of circular dichroism from 39 to −37.5 dB and optical activity from −35° to 30°. Moreover, the maximum spin isolation over 32.6 dB is also obtained near 0.5 THz. This mechanism provide a new way to realize independent manipulation and active modulation of THz spin photons more flexibly.

Compact adiabatic mode (de)multiplexer using a subwavelength grating waveguide in the silicon-on-insulator platform

Mode-division multiplexing technology holds great promise for addressing the ever-increasing demand for data transmission capacity. This paper proposes a compact adiabatic mode (de)multiplexer [(de)MUX] using a subwavelength grating (SWG) waveguide in the silicon-on-insulator platform, with optimization for the TE0-TE1 and TE0-TE2 mode (de)MUXs. By introducing an SWG waveguide, the coupling strength of waveguides can be enhanced, making it possible for the realization of more compact adiabatic mode (de)MUXs. The adiabatic evolution lengths for TE0-TE1 and TE0-TE2 mode (de)MUXs are only 10 µm and 17.5 µm, respectively. The numerical simulation shows that the operating bandwidth of the proposed device is beyond 200 nm. For the TE0-TE1 mode (de)MUX, the insertion loss and mode crosstalk of TE0-TE1 mode conversion within the whole wavelength range of 1450–1650 nm are less than 0.25 dB and −32.0dB, respectively. For the TE0-TE2 mode (de)MUX, the insertion loss and mode crosstalk of TE0-TE2 mode conversion within the entire bandwidth are less than 0.26 dB and −27.4dB, respectively. The TE0-TE1 and TE0-TE2 mode (de)MUXs can be cascaded to form a three-mode (de)MUX. For TE0-TE0, TE0-TE1, and TE0-TE2 processes within the entire bandwidth, the mode crosstalks are less than −33.5dB, −26.1dB, and −25.8dB, respectively. The device is scalable to the conversion of TE0 mode to higher-order mode.

Terahertz SWNT-based fluidic chip for sensing enantioselectivity

Enantioselectivity sensing is crucial in biological systems due to the impact of the selective behaviors of chiral compounds on their targets. Conventional approaches for detecting enantioselectivity are restricted by the presence of high phonon energy, complex device manufacturing processes, low sensitivity, and the need for large sample sizes. Here, we propose a single-walled carbon nanotube (SWNT)-based fluidic chip that uses terahertz (THz) optical rotatory dispersion (ORD) spectroscopy to detect tartaric acids with high selectivity in very small amounts of liquid. The chip is composed of tailored U-shaped metasurfaces that show significant amplification of the near-field around the typical peaks of tartaric acids in the ORD spectrum. Additionally, it includes subwavelength gratings made of SWNTs, allowing for accurate detection of polarization angles. The limit of detection (LOD) for d-tartaric acid and l-tartaric acid are 17.9 mg/L and 11.0 mg/L, respectively. The sensitivities are superior to those of UV ORD or CD spectrometers. Furthermore, the presence of tartaric acid in wine is effectively identified, with a LOD of 25.60 mg/L. This technological development provides a significant improvement in chiral analysis by allowing for quick, highly sensitive, and precise detection of enantiomers.

Subwavelength Photorefractive Grating in a Thin‐Film Lithium Niobate Microcavity

AbstractSubwavelength gratings play a fundamental and pivotal role in numerous science and applications for wave manipulation, exhibiting distinctive features such as filtering, phase manipulation, and anti‐reflection. However, conventional fabrication methods for ultrasmall periodic structures are constrained by the fundamental optical diffraction limit, making it challenging to produce subwavelength gratings for optics. Here, a novel technique is demonstrated to build a reconfigurable subwavelength photorefractive grating (SPG) in a thin‐film lithium niobate on the platform of an optical microcavity. Such SPGs are optically induced through the photorefractive effect and the subwavelength features originate from the spatial phase modulations of the pump's standing wave. The resulting SPGs lead to the mode splitting of two counter‐propagating modes inside the microcavity, exhibiting an Electromagnetically Induced Transparency (EIT)‐like transmission spectrum. Moreover, the unique subwavelength characteristic of SPGs enables first‐order quasi‐phase‐matching for backward second‐harmonic generation, a long‐standing problem in nonlinear optics. Also, free‐space‐to‐chip vertical nonlinear frequency conversion can be achieved in a similar manner. These results provide a flexible approach toward fabricating subwavelength gratings, which holds significant potential in various applications such as nonlinear frequency conversion, optical communication, sensing, and quantum technologies.

Low loss, wideband, and high extinction ratio TM polarizer based on subwavelength gratings

We propose a low loss, wideband silicon transverse magnetic (TM) polarizer with high polarization extinction ratio and low reflection based on subwavelength grating. By arranging and optimizing a mutually perpendicular subwavelength grating with different duty cycles as the core and cladding, efficient waveguiding and radiation can be achieved for the TM and transverse electric (TE) injection, respectively. In simulation, the proposed TM polarizer has a footprint of 40µm×16.68µm, an insertion loss <0.7dB, a polarization extinction ratio ≥20dB, and an unwanted TE reflection <−17.4dB in the wavelength range of 1230–1700 nm. Moreover, the fabrication tolerance of the proposed device is also investigated.

3D Printing of Glass Micro-Optics with Subwavelength Features on Optical Fiber Tips.

Integration of functional materials and structures on the tips of optical fibers has enabled various applications in micro-optics, such as sensing, imaging, and optical trapping. Direct laser writing is a 3D printing technology that holds promise for fabricating advanced micro-optical structures on fiber tips. To date, material selection has been limited to organic polymer-based photoresists because existing methods for 3D direct laser writing of inorganic materials involve high-temperature processing that is not compatible with optical fibers. However, organic polymers do not feature stability and transparency comparable to those of inorganic glasses. Herein, we demonstrate 3D direct laser writing of inorganic glass with a subwavelength resolution on optical fiber tips. We show two distinct printing modes that enable the printing of solid silica glass structures ("Uniform Mode") and self-organized subwavelength gratings ("Nanograting Mode"), respectively. We illustrate the utility of our approach by printing two functional devices: (1) a refractive index sensor that can measure the indices of binary mixtures of acetone and methanol at near-infrared wavelengths and (2) a compact polarization beam splitter for polarization control and beam steering in an all-in-fiber system. By combining the superior material properties of glass with the plug-and-play nature of optical fibers, this approach enables promising applications in fields such as fiber sensing, optical microelectromechanical systems (MEMS), and quantum photonics.

High-Efficiency Metamaterial-Engineered Grating Couplers for Silicon Nitride Photonics.

Silicon nitride (Si3N4) is an ideal candidate for the development of low-loss photonic integrated circuits. However, efficient light coupling between standard optical fibers and Si3N4 chips remains a significant challenge. For vertical grating couplers, the lower index contrast yields a weak grating strength, which translates to long diffractive structures, limiting the coupling performance. In response to the rise of hybrid photonic platforms, the adoption of multi-layer grating arrangements has emerged as a promising strategy to enhance the performance of Si3N4 couplers. In this work, we present the design of high-efficiency surface grating couplers for the Si3N4 platform with an amorphous silicon (α-Si) overlay. The surface grating, fully formed in an α-Si waveguide layer, utilizes subwavelength grating (SWG)-engineered metamaterials, enabling simple realization through single-step patterning. This not only provides an extra degree of freedom for controlling the fiber-chip coupling but also facilitates portability to existing foundry fabrication processes. Using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations, a metamaterial-engineered grating coupler is designed with a coupling efficiency of -1.7 dB at an operating wavelength of 1.31 µm, with a 1 dB bandwidth of 31 nm. Our proposed design presents a novel approach to developing high-efficiency fiber-chip interfaces for the silicon nitride integration platform for a wide range of applications, including datacom and quantum photonics.

Ultra-broadband TM-pass polarizer based on anisotropic metamaterials in lithium niobate on an insulator.

An ultra-broadband TM-pass polarizer is designed, fabricated, and experimentally demonstrated based on subwavelength grating (SWG) metamaterials in a lithium niobate on an insulator (LNOI) platform. According to our simulation, the designed device is predicted to work at a 220 nm wavelength range from 1460 to 1680 nm, covering the S-, C-, L-, U-bands of optical fiber communication. By depositing and subsequently etching a silicon nitride thin film atop the LNOI chip, the SWG structures are formed successfully by using complementary metal-oxide semiconductor (CMOS)-compatible fabrication processes. The measured results show a high polarization extinction ratio larger than 20 dB and a relatively low insertion loss below 2.5 dB over a 130 nm wavelength range from 1500 to 1630 nm, mainly limited by the operation bandwidth of our laser source.

Triple-broadband asymmetric transmission via cross-polarization conversion based on composite chiral metasurface structure

In this paper, a novel composite chiral metasurface (CCMS) was proposed and investigated, which is composed of a rectangle-patch-ring resonator (RPRR) structure sandwiched between two twisted sub-wavelength metal gratings separated by a dielectric substrate. Both simulation and experimental results demonstrate that the proposed CCMS achieves a significant asymmetric transmission (AT) effect and efficient cross-polarization conversion for the incident linear polarization wave in a triple-broadband range. Simulation results are in good agreement with the experiments. Specifically, the CCMS converts normal impinging y-/x-polarization wave along the forward/backward (-z/+z) direction into transmitted x-/y-polarization wave with the cross-polarization transmission coefficient over 0.7 at 4.15–5.5 GHz, 7.29–10.77 GHz and 12.49–16.59 GHz, respectively. In addition, the AT coefficient (Δlin) and the total transmittance (Tx) of the x-polarization wave propagation along the –z axis direction are both over 0.5 in the triple-broadband frequency range. The simulated polarization azimuth rotation and ellipticity angles, induced surface current, and electric field vector distributions further confirm the characteristics of the triple-broadband high-efficiency AT effect and cross-polarization conversion of the designed CCMS. The proposed CCMS design serves as an important reference for practical applications of microwave devices.

Subwavelength Grating Waveguide Supported by a Magnetic Dipole Mode

Subwavelength Grating Waveguide Supported by a Magnetic Dipole Mode

Artificial neural network assisted the design of subwavelength-grating waveguides for nanoparticles optical trapping.

In this work, we propose artificial neural networks (ANNs) to predict the optical forces on particles with a radius of 50 nm and inverse-design the subwavelength-grating (SWG) waveguides structure for trapping. The SWG waveguides are applied to particle trapping due to their superior bulk sensitivity and surface sensitivity, as well as longer working distance than conventional nanophotonic waveguides. To reduce the time consumption of the design, we train ANNs to predict the trapping forces and to inverse-design the geometric structure of SWG waveguides, and the low mean square errors (MSE) of the networks achieve 2.8 × 10-4. Based on the well-trained forward prediction and inverse-design network, an SWG waveguide with significant trapping performance is designed. The trapping forces in the y-direction achieve-40.39 pN when the center of the particle is placed 100 nm away from the side wall of the silicon segment, and the negative sign of the optical forces indicates the direction of the forces. The maximum trapping potential achieved to 838.16 kBT in the y-direction. The trapping performance in the x and z directions is also quite superior, and the neural network model has been further applied to design SWGs with a high trapping performance. The present work is of significance for further research on the application of artificial neural networks in other optical devices designed for particle trapping.

Broadband 2 × 2 multimode-interference coupler on the silicon-nitride platform.

In this paper, we present the design, optimization, and implementation of a sub-wavelength grating (SWG) multi-mode interference coupler (MMI) on the silicon nitride photonic integrated circuit (PIC) platform with a significantly enhanced bandwidth compared to the conventional MMI. We extend the SWG MMI theory, previously presented for the silicon-on-insulator platform, to the Si3N4/SiO2 platform. Our approach involves an initial parameter optimization for a non-paired design, followed by a shift to a paired design that offers a smaller footprint and a broader bandwidth. The optimized SWG MMI exhibits a 1 dB bandwidth of 300 nm for both the insertion loss and power imbalance, making it a significant addition to silicon nitride photonics.

Characterization of Thin AlN/Ag/AlN-Reflector Stacks on Glass Substrates for MEMS Applications

Thin metal layers such as silver (Ag) are being utilized for various optical and plasmonic applications as well as for electrical purposes, e.g., as transparent electrodes in display devices or solar cells. This paper focuses on optical MEMS applications such as the Fabry–Pérot interferometer (FPI). Within such filters, reflector materials such as distributed Bragg reflectors (DBRs) or subwavelength gratings (SWGs) have been widely used so far, whereas metallic thin films (MTFs) were limited in application due to their comparatively higher absorption. In this paper, thin sputtered Ag layers with thicknesses of 20, 40 and 60 nm on glass substrates have been investigated, and it is shown that the absorption is very low in the visible spectral range (VIS) and increases only in near-infrared (NIR) with increasing wavelength. Thus, we consider Ag-thin layers to be an interesting reflector material at least for the VIS range, which can be easily fabricated and integrated. However, Ag is not inert and stable when exposed to the atmosphere. Hence, it needs a passivation material. For this purpose, AlN has been chosen in this contribution, which can be deposited by sputtering as well. In this contribution, we have chosen thin AlN layers for this purpose, which can also be deposited by sputtering. Thus, various AlN/Ag/AlN-reflector stacks were created and patterned by lift-off technology preferably. The fabricated reflectors were characterized with respect to adhesion, stress, cohesion, homogeneity, and most importantly, their optical properties. It was found that the thickness of the AlN can be used to adjust the reflectance–transmittance ratio in the VIS range, and influences the adsorption in the NIR range as well. Based on the measured values of the reflectors with 40 nm Ag, an exemplary transmission filter characteristics has been predicted for a wavelength range from 400 to 800 nm. Both the maximum transmittance and the full width at half maximum (FWHM) can be tuned by variation of the AlN thickness from 20 to 60 nm.

An investigation into multidimensional information encryption through structural color in electrically responsive subwavelength gratings

In the vanguard of safeguarding data integrity, optical encryption and anti-counterfeiting measures are indispensable. Structural color, with its inherent optical exclusivity, including tunable chromaticity and intricate high-resolution patterning, stands at the forefront of this domain. Despite its promise, the proliferation of structural color technologies in anti-counterfeiting applications is curtailed by the exorbitant production costs and the current limitations in information capacity and security. Addressing these constraints, our study delineates a novel encryption paradigm that interlaces color and digital data within a subwavelength grating matrix. This synergy is fortified by a tri-layered encryption schema, amalgamating electrical response signatures, inherent optical attributes, and the robust RSA algorithm, thereby elevating the information capacity exponentially to 10n and reinforcing multi-faceted security throughout transmission. Our approach heralds a new era in the realm of high density, secure information storage.

Ultracompact and ultrabroadband arbitrary ratio power splitter using subwavelength gratings

An ultracompact and ultrabroadband arbitrary ratio power splitter based on adiabatically tapered silicon waveguides, with subwavelength gratings in the coupling region, is proposed and demonstrated experimentally. Various power splitting ratios (PSRs) can be implemented by flexibly manipulating the gap of two adjacent tapered waveguides. The wavelength dependence is greatly reduced by introducing subwavelength gratings. Simulation results show that our proposed device has a 400 nm (1300 nm–1700 nm) bandwidth with an insertion loss <0.5dB for PSRs of 50:50, 60:40, 70:30, 80:20, and 90:10, and the corresponding total device length is only 2.9 µm. The experimental results indicate that the insertion loss is lower than 0.82 dB over a wide bandwidth of 80 nm, and there is a PSR variation less than 2.5% in the range of 1530 nm to 1610 nm.

Tunable Fabry-Perot interferometer operated in the terahertz range based on an effective refractive index control using pitch-variable subwavelength gratings.

We constructed a tunable Fabry-Perot interferometer (FPI) by controlling the effective refractive index of pitch-variable subwavelength gratings (PV-SWGs) that were incorporated into an FP cavity. The period of the PV-SWG can be varied to change the effective refractive index and shift the optical resonant frequency of the FPI. Compared with conventional methods that tune the optical resonance by adding fillers or deforming the cavity, the proposed FPI obtained a higher transmission and quality factor (Q-factor) for the transmittance peak, and its resonant frequency can be shifted by simply stretching the PV-SWG. A peak transmittance of 0.87, a Q-factor of 34, and a frequency shift of 17 GHz were obtained by the PV-SWG-based FPI for THz incomes around the frequency of 0.303 THz. As the effective refractive index and the working frequency can be tailored by altering the geometry design of the PV-SWG, the FPI holds significance for the development of THz communications and for applications at different wave bands.

Low loss and ultra-broadband design of an integrated 3 dB power splitter centered at 2 µm.

Because chemical gas is sensitive to absorption in the 2µm band, and 2µm matches the absorption band of the remote sensing material, many remote sensors and optical sensors are designed to operate in the 2µm wavelength region. In this paper, we designed an integrated 3dB power splitter centered at 2µm. The study of this device is built on a silicon-on-insulator (SOI) platform. We introduced a subwavelength grating (SWG) to improve the performance of the device. We used the three-dimensional finite-difference time-domain (3D FDTD) method to analyze the effect of the structure on the power splitter. The insertion loss (IL) of the fundamental TE mode is only 0.04dB at 2µm and its bandwidth of IL <0.45d B is 940nm (1570-2510nm). It is suitable for multidomain and all-band photonic integrated circuits at 2µm.

Integrated polarization-free Bragg filters with subwavelength gratings for photonic sensing.

We present polarization-free Bragg filters having subwavelength gratings (SWGs) in the lateral cladding region. This Bragg design expands modal fields toward upper cladding, resulting in enhanced light interaction with sensing analytes. Two device configurations are proposed and examined, one with index-matched coupling between transverse electric (TE) and transverse magnetic (TM) modes and the other one with hybrid-mode (HM) coupling. Both configurations introduce a strong coupling between two orthogonal modes (either TE-TM or HM1-HM2) and rotate the polarization of the input wave through Bragg reflection. The arrangements of SWGs help to achieve two configurations with different orthogonal modes, while expanding modal profiles toward the upper cladding region. Our proposed SWG-assisted Bragg gratings with polarization independency eliminate the need for a polarization controller and effectively tailor the modal properties, enhancing the potential of integrated photonic sensing applications.

Low-loss grating coupler with a subwavelength structure on a thin-film lithium niobate substrate.

We demonstrated a low-loss O-band grating coupler on an x-cut thin-film lithium niobate substrate by implementing subwavelength and apodized structures. The subwavelength gratings were used to mitigate the refractive index discontinuity between the input taper and grating region, which was the first application of such a structure for grating coupler optimization on a thin-film lithium niobate substrate. The coupling efficiency was measured to be -1.99 dB/coupler at a wavelength of 1312.8 nm, which was the lowest loss among the reported lithium niobate grating couplers that do not use metal mirrors. The proposed design does not require metal mirrors or any additional material layers and can be easily fabricated with a single-step lithography and etching processes.