We herein report the development of the sputtering process for the fabrication of thin film low-temperature solid oxide fuell cells (LT-SOFCs) supported by anodized aluminum oxide (AAO). The process development has been conducted for each component, anode, electrolyte, electrolyte/cathode interlayer, and cathode to achieve not only high performance but also durability. In order to fabricate catalyst-ion conducting anode cermet, Ni and GdCe co-sputtering is utilized. Since the AAO is an electrical insulator, the electrons produced from the anode requires to pass through the thin anode layer to be collected which can lead to high current collecting resistance. Therefore, sputtering conditions such as power, pressure, and time are adjusted to produce the anode with minimal ohmic loss stemming from current collection. For the electrolyte (YSZ) and interlayer (GDC), a ceramic sputtering recipe has been developed to achieve high density and uniformity, which are the most critical requirement for these components. Through optimization of the gun angle, power, pressure, and the target to substrate distance (TSD), a highly dense and uniform ceramic electrolyte can be deposited on various AAO substrate sizes. For the cathode, a mixed ionic electronic conducting cathode sputtering recipe has been developed to enhance oxygen reduction reaction (ORR) at low operating temperatures. We have been developing the sputtering process to fabricate a nanocrystalline and highly porous LSC-GDC cathode with desired microstructure to enhance the ORR activity. Through the integration of the aforementioned sputtering process development, durable and high performance LT-SOFCs have been successfully fabricated on AAO substrates up to 15cm x 15cm size. Suppered thin film cells have shown superior performance at low operating temperatures, e.g., peak power density of 1.5W/cm2 at 550oC with hydrogen fuel.