In this paper, we have studied and proposed a planar Tunnel FET device with source side SiGe pocket and hetero-gate dielectric structure that works by utilizing quantum mechanical Band-to-Band tunnelling (BTBT) mechanism. Simulation results obtained using a calibrated SILVACO TCAD device simulator show that the device exhibits good ambipolar performance because of the hetero-gate dielectric and the use of source pocket leads to steep point subthreshold swing of 4.90 mV/dec., an average subthreshold swing of 25.31 mV/dec. and a threshold voltage of 0.23 V. For including the hetero-gate dielectric, the variation in drain current values with high-κ dielectric length is analysed. The change in transfer characteristics with pocket parameters including pocket length and pocket doping is also reported. A 4 nm Si0.7Ge0.3 n+ pocket with doping concentration of 5 × 1019 cm−3 is found to show the maximum ON-OFF current ratio of 5.23 × 1011. This paper also performs a comparative study between different TFET structures and the analysis clearly highlights the potential of proposed Source Pocket-Engineered Hetero Gate Dielectric (SPE-HGD) TFET device for low-power and energy-efficient applications.
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