Transport characteristics were investigated in a spin metal–oxide–semiconductor field-effect transistor (spin MOSFET) with ferromagnetic MnAs source and drain (S/D) contacts. A bottom-gate type spin MOSFET was fabricated by photolithography using an epitaxial MnAs film grown on a silicon-on-insulator (SOI) substrate. In-plane magnetoresistance showed a square like hysteretic behavior, when measurements were performed with constant source–drain and source–gate biases. From the comparison with the magnetization-related resistance change resulting from the MnAs contacts, a highly possible origin of the feature obtained for the spin MOSFET is the spin-valve effect originating from the spin-dependent transport in the Si channel.