The optical characteristics of amorphous zinc oxide (a-ZnO) thin films grown by radio frequency reactive magnetron sputtering on various substrates at temperature < 325 K have been investigated in the spectral range 340–1600 nm. The amorphous nature of the a-ZnO films was verified by X-ray diffraction and the optical constants were obtained by analysis of the measured ellipsometric spectra using the Cauchy–Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range 1.67–1.93 and 3.9 × 10 − 8 –0.32, respectively. The band edge of the films on Si (100) and quartz has been determined by spectroscopic ellipsometry (3.39 ± 0.05 eV) and spectrophotometric (3.35 ± 0.05 eV) methods, respectively. From the angle dependence of the p-polarized reflectivity we deduce a Brewster angle of 60.5°. Measurement of the polarized optical properties shows a high transmissivity (81%–99%) and low absorptivity (< 5%) in the visible and near infrared regions at different angles of incidence. Also, we found that there was a higher absorptivity for wavelength < 370 nm. This wavelength, ∼ 370 nm, therefore indicated that the band edge for a-ZnO thin films is about 3.35 eV.