We present experimental results obtained in solid Cu targets coated with ∼18 nm thick CsBr films operating in a reflection mode. The results indicate a factor of 50X increase in quantum efficiency relative to uncoated Cu samples. The CsBr/Cu samples are very robust allowing brief exposures to air without a substantial decrease in quantum efficiency and lifetime. The results are very encouraging from the point of view of reliable high efficiency electron sources for lithography or other applications including free electron lasers.