Herein, PbZrO3 (PZO) films with good density and homogeneity were grown on a LaNiO3 (LNO)-buffered Si(100) substrate by a conventional and low-cost sol–gel spin-coating technique. The results indicated that the PZO films prepared on the LNO/Si substrate can be fabricated into a Au/PZO/LNO/Si heterojunction device via annealing at 650 °C under an air atmosphere. The device exhibited excellent and repeatable bipolar resistance switching (RS) behavior at room temperature. Its high/low resistance ratio reached 102 at +0.2 and -0.2 V bias voltages, and the RS characteristics of the device did not significantly deteriorate after 100 consecutive cycles of testing. Weibull distribution results show that the proposed device has a uniform and stable high/low-resistance state. Furthermore, we demonstrated that the conduction mechanisms of the device are Ohmic conduction and Schottky emission. The modulation of a Schottky-like barrier owing to the migration of oxygen vacancies in the PZO films is considered to be responsible for the RS phenomenon of the Au/PZO/LNO/Si device.
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