For local structure and electronic state analyses of electron trapping centers, we developed a site-selective x-ray absorption fine structure XAFS measurement, i.e., the capacitance XAFS method. The concept of the capacitance XAFS measurement is based on the fact that the x-ray absorption of trapping centers, not the bulk, can be evaluated from the capacitance change due to x-ray induced photoemission of a localized electron. With this method, micro spectroscopy can be achieved by scanning probe detection of the capacitance. Moreover, trapping centers with a specific eigen-energy can be selectively observed by controlling the sample bias voltage. We tested these advantages in detail for two typical metal and semiconductor systems. (1) The capacitance XAFS spectrum of Cu indicated twodimensional (2D) electronic states at a hetero interface between native oxide (Cu2O) and bulk Cu; the Cu 4pπ states of the electron trap were confined into a 2D plane. (2) The capacitance XAFS spectrum of GaAs depends on the sample bias voltage and on selectively indicated electronic states of surface trapping center due to Ga oxide, which captures electrons at a positive bias voltage.