Capacitance X-ray absorption fine structure measurement using scanning probe A new method for local structure analysis of surface defects

Abstract

A capacitance X-ray absorption fine structure (XAFS) method using a scanning probe is developed for the selective analysis of surface defects in selected local regions. Since capacitance is sensitive to localized electrons in defects, capacitance change owing to X-ray absorption will provide site-selective XAFS spectra of the defects. The capacitance detection by the scanning probe under an X-ray beam gives XAFS spectra dependent on the surface state. An electron transition model, in which the surface density of states is taken into account, reproduces the spectral shape differences between the normal surface and defect surface.