techniques. The requirement forthe vacuum process however limits the exploitation ofthis technology to batch processing. As a result, there hasbeen an increasing interest in the use of atmosphericpressure plasmas for continuous processing. In this study,silicon-containing coatings were deposited from four typesof liquid siloxane precursors, with varying molecularstructures, as follows: poly(dimethylsiloxane) (PDMS),tetraethylorthosilicate (TEOS), octamethylcyclotetrasilox-ane (OMCTS) and hexamethyldisiloxane (HMDSO). Theobjective of this study was to evaluate both the influenceof siloxane precursor structure and the level of exposure ofthe precursor to the plasma, on the properties of thedeposited coatings. Amongst the properties evaluatedwere deposited coating thickness, surface energy, mor-phology and coating siloxy chemistry and elementalcomposition.