Optical waveguide sensors have been widely used in biosensing applications. However, ensuring an improvement in the sensitivity and detection limit of these sensors with low fabrication complexity and high integration capacity is essential for them to stand out among new sensing technologies. In this context, a refractive index (RI) sensor based on intensity detection is proposed and numerically simulated in this work. The sensor is composed of a non-complex structure based on a silicon nitride (Si3N4) tapered waveguide on a silicon substrate, which is integrated with a sensing window. The tapered waveguide design aims to enlarge the interaction area of the evanescent field, increasing significantly the device sensitivity. In order to verify the sensor performance and provide a high fidelity numerical simulation, it is employed a 3D semi-vectorial beam propagation method (BPM). Both bulk and surface maximum sensitivity is computed and the values of 1701%/RIU and 1.74%/nm are obtained, respectively. These results suggest that the proposed sensor is compact, structurally simple, and provides better performance than complex sensors presented in the literature.
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