The surging demand for monocrystalline silicon materials in the production of microelectronic components highlights its crucial role in the semiconductor and optic industries. Hence it is inevitable to produce a silicon workpiece with high quality finish to meet the demand in semiconductor industries. Due to high brittleness, controlling the quality of silicon in surface machining is quite difficult. Traditional manufacturing processes induce issues like rough surfaces and edge chipping. It was reported that rotary ultrasonic surface machining (RUSM) can effectively reduce cutting force, roughness, and edge chipping in machining of brittle materials. There have been several studies on drilling and sliding silicon materials using rotary ultrasonic machining investigating the effects of machining parameters on the output variables such as cutting force, torque, edge chipping, surface roughness etc. However, to the best of the authors’ knowledge, there are no reported investigations on effects of machining variables (ultrasonic power and tool rotation speed) in surface machining of silicon materials using the rotary ultrasonic machining. This study aimed to investigate the impacts of ultrasonic power and tool rotation speed on the cutting force, edge chipping, and surface roughness. Experimental results show that the ultrasonic vibration and tool rotation speed had a notable impact on edge chipping and cutting forces. Lastly, the current research has paved the way for widening the research on investigating grinding of the silicon wafer in semiconductor manufacturing with ultrasonic vibration and high rotation speed. In semiconductor wafer manufacturing, grinding process is used to reduce the flatness but generate surface and subsurface damage. With further investigations, RUSM can contribute to reducing these damages.