Reactive Magnetron Sputtering Technique Research Articles

Changes in chemical composition of TixAl1−xN coatings immersed in oxygen-saturated Lead–Bismuth Eutectic at low and moderate temperatures (250 °C ≤ T ≤ 410 °C)

Lead–Bismuth Eutectic (LBE) will serve as a liquid metal coolant in accelerator-driven systems, posing a corrosive threat to exposed materials. To address this challenge, TixAl1-xN coatings (0.38 ≤ x ≤ 0.58) were applied onto AISI 316 L austenitic stainless steel using the reactive bipolar magnetron sputtering technique. These coated samples underwent immersion in static oxygen-saturated LBE at temperatures of 250 °C and 360 °C for durations of 500 h and 1000 h, and at 410 °C for 500 h. XPS depth profiles revealed minimal oxidation at 250 °C even after 1000 h. However, at 360 °C, a mixed oxide layer of (Ti, Al)Ox was formed on the coating's surface. Exposure to LBE at 410 °C for 500 h led to the creation of an oxide bilayer comprising TiO2 (outer sublayer) and (Ti, Al)Ox depleted of Ti (inner sublayer). A model is proposed to illustrate the oxidation mechanism.

Tailoring the mechanical and high‐temperature tribological properties of Si‐DLC films by controlling the Si content

The poor high‐temperature tribological performance of diamond‐like carbon (DLC) films severely limits their applications. To address this issue, silicon (Si) doped DLC films with Si content ranging from 0 to 11.52 at.% were synthesized utilizing the plasma‐assisted reactive magnetron sputtering technique. The influence of Si incorporation on the microstructure and mechanical properties was meticulously investigated by Raman spectroscopy, scanning electron microscope (SEM), X‐ray photoelectron spectroscopy (XPS), nanoindentation, and scratch testing. To ascertain the tribological behavior of the Si‐DLC films under elevated temperature conditions, in situ high‐temperature tests were conducted, spanning temperatures from ambient to 500°C. The findings indicated that distinct lubrication mechanisms prevail for Si‐DLC films with varying Si content across different temperature domains. As the test temperature and Si content increased, the lubrication mechanism exhibited a gradual transitions from high‐temperature induced graphitization to a particle wear regime dominated by SiC and formed SiO2 abrasive phases. The comprehensive performance of the films peaked at a Si content of 4.72 at.%, suggesting an optimal composition for high‐temperature applications. It is postulated that the in‐depth investigation presented herein holds considerable value for the design and fabrication of DLC films intended for use in high‐temperature settings, potentially unlocking their full potential in such demanding environments.

Transmission electron microscopy reveals clusters of Au–Ag nanoparticles formed in TiO2 thin film, with enhanced plasmonic response

This work reports on the influence of nanoparticle (NP) size distribution and the chemical nature of gold (Au) and/or silver (Ag) NPs in the localized surface plasmon resonance (LSPR) responses. The NPs were produced embedded in a titanium dioxide (TiO2) thin film, deposited by reactive magnetron sputtering technique followed by in-vacuum thermal treatment at 400 °C. High-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) gave quantitative key information in terms of both the size and distribution of the noble metal NPs. The average Feret diameter was 17 nm (σ = 8) and 55 nm (σ = 28) for Au/TiO2 and Ag/TiO2 films, respectively, while the Au–Ag/TiO2 film showed intermediate values, with an average size of 22 nm (σ = 9). HAAD-STEM, complemented by EDX chemical mapping, revealed an unusual formation of cluster structures containing local distributions of bimetallic (alloyed) Au–Ag NPs. The synergetic characteristics and properties of such bimetallic Au–Ag NPs resulted in an outstanding LSPR sensitivity compared to the monometallic counterparts. Furthermore, the analysis of the average nearest neighbor distances (about one order of magnitude lower than counterparts) suggests the existence of plasmonic hotspots relevant to be explored in sensing and surface-enhanced spectroscopies.

Synthesis and characterization of low-friction W-V-N alloy coatings using reactive magnetron sputtering technique for tribological applications

In recent years, self-lubricating hard coatings have garnered significant interest across various industries such as cutting tools, molds, and manufacturing because of their ability to reduce friction and wear at high temperatures in dry-cutting applications. The present study focuses on synthesis of tungsten-vanadium-nitride (W-V-N) coatings using the reactive magnetron cosputtering technique in an Ar + N2 plasma gas environment. The coating microstructure, surface morphology, wetting behavior, and mechanical properties were characterized by grazing incidence x-ray diffraction, field-emission scanning electron microscopy, atomic force microscopy, energy-dispersive spectroscopy, and nanoindentation. Wear resistance properties of the prepared W-V-N alloy coatings were investigated using a ball-on-disk tribometer at two different temperatures. The findings indicate that all W-V-N coatings, regardless of the vanadium content, exhibit a face-centered cubic structure and form a solid solution of W-V-N. Among the coatings studied, W0.68V0.32N exhibited the highest hardness (14.25 GPa) and Young's modulus (257.53 GPa), as well as an excellent wear resistance. Increasing the vanadium content in the W-V-N coating led to a notable reduction in both the specific wear rate and friction coefficient. Moreover, this reduction was more pronounced with an increase in temperature during the wear test. Improvement in the wear properties can be attributed to the formation of Magnéli phases of vanadium oxides on the surface of the coatings. The ability of the W-V-N coating to reduce friction and wear, combined with its improved mechanical properties, makes it a promising candidate for solid lubricating coatings in tribological applications.

Fabrication, microstructures and optical reflectivity of TiAlN/NiCr composite coating

In this work, TiAlN/NiCr composite coatings were prepared by reactive magnetron sputtering technique. Firstly, a single absorber layer was prepared, and at the substrate temperature of 300 °C, a “prismatic” structure is formed on the surface of the TiAlN film, which has good light absorption properties under these conditions. In order to further improve its absorption, the TiAlN/NiCr bilayer coating was designed, and the effects of etching in two different solutions and subsequent annealing treatments on the surface microstructure and reflectivity of the bilayer coating were investigated. These results show that TiAlN/NiCr bilayer coatings fabricated in various etching solutions can further improve light absorption performance, with the TiAlN/NiCr-CAN coating showing particularly good thermal stability and exhibiting further improvements in absorption performance after 500 °C/2 h of annealing. Low-temperature applications are the only ones for which the TiAlN/NiCr–HF coating is suitable, since it fails at the annealing condition of 300 °C/2 h.

Pseudocapacitive Storage in Molybdenum Oxynitride Nanostructures Reactively Sputtered on Stainless-Steel Mesh Towards an All-Solid-State Flexible Supercapacitor.

Exploiting pseudocapacitance in rationally engineered nanomaterials offers greater energy storage capacities at faster rates. The present research reports a high-performance Molybdenum Oxynitride (MoON) nanostructured material deposited directly over stainless-steel mesh (SSM) via reactive magnetron sputtering technique for flexible symmetric supercapacitor (FSSC) application. The MoON/SSM flexible electrode manifests remarkable Na+-ion pseudocapacitive kinetics, delivering exceptional ≈881.83Fg-1 capacitance, thanks to the synergistically coupled interfaces and junctions between nanostructures of Mo2N, MoO2, and MoO3 co-existing phases, resulting in enhanced specific surface area, increased electroactive sites, improved ionic and electronic conductivity. Employing 3D Bode plots, b-value, and Dunn's analysis, a comprehensive insight into the charge-storage mechanism has been presented, revealing the superiority of surface-controlled capacitive and pseudocapacitive kinetics. Utilizing PVA-Na2SO4 gel electrolyte, the assembled all-solid-state FSSC (MoON/SSM||MoON/SSM) exhibits impressive cell capacitance of 30.7mFcm-2 (438.59Fg-1) at 0.125mAcm-2. Moreover, the FSSC device outputs a superior energy density of 4.26µWhcm-2 (60.92Whkg-1) and high power density of 2.5mWcm-2 (35.71kWkg-1). The device manifests remarkable flexibility and excellent electrochemical cyclability of ≈91.94% over 10,000 continuous charge-discharge cycles. These intriguing pseudocapacitive performances combined with lightweight, cost-effective, industry-feasible, and environmentally sustainable attributes make the present MoON-based FSSC a potential candidate for energy-storage applications in flexible electronics.

High temperature AlN thin film ultrasonic transducers with dual mode wave excitation

AlN thin film ultrasonic transducers with dual mode wave (transverse and longitudinal) excitation were deposited by reactive RF magnetron sputtering technique. The transducers deposited at radial distances of 0 and 50 mm in the sample plane exhibited well-developed straight and inclined columnar structures with dominating (002) and (103) X-ray diffraction peaks, respectively. The transducers deposited at radial distances of 0, 30, and 50 mm demonstrated excitation of longitudinal, transverse, and longitudinal-transverse waves, respectively. Short term heat treatment was conducted in air within a temperature range of 20–900 °C to investigate the high temperature ultrasonic response. Temperature dependencies of the time-of-flight and pulse-echo amplitude were analyzed. Long term heat treatment in air at 700 °C for 192 h revealed a degradation of ultrasonic response due to the oxidation of the AlN layer.

Defect structure of high-resistance CdTe:Cl single crystals and MoOx/CdTe:Cl/MoOx heterostructures according to the data of high-resolution X-ray diffractometry

Clorine doped CdTe single crystals (CdTe:Cl) were grown by the traveling heater method. MoO x /CdTe:Cl/MoO x films were deposited using the reactive magnetron sputtering technique. The defect structure of the obtained single crystals and heterostructures was investigated using high-resolution X-ray diffractometry. The optimized models of dislocation systems in the CdTe:Cl single crystals were constructed based on the Thompson tetrahedron. The distribution of the intensity of diffracted X-rays as a function of reciprocal space coordinates and rocking curves was analyzed using the kinematic theory of X-ray scattering in real crystals. The experimental and theoretically predicted values of the helical dislocation densities in the CdTe:Cl and MoO x /CdTe:Cl crystals with perfect and mosaic structures were compared. Two-fold increase in the dislocation concentration in the MoO x /CdTe:Cl heterostructures as a result of compression deformations of the CdTe:Cl crystal lattice was found. The ~0.1 μm thick transition deformed layer at the boundary between the MoO x film and CdTe:Cl single crystal significantly affects the electrical and spectroscopic properties of the obtained systems as the materials for γ-radiation detection.

The effect of DC power and annealing on the structural, optical, and electrical characteristics of sputtered amorphous WOX thin films

Tungsten oxide (WOX) is considered as one of the promising materials due to its unique properties in widespread optoelectronic and photonic applications. This study reports on the deposition of WOX thin films via reactive magnetron sputtering technique with various low DC power and constant sputtering pressure at room temperature. XRD results reveal that an amorphous state for all the as-deposited films, while annealed films at 650 °C have WO3 monoclinic structure. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) studies indicate all as-deposited films have a dense, homogeneous, and quite smooth surface with a root-mean-square roughness (σRMS) below 1 nm. Annealing significantly affects film morphology, the formation of large grains and increasing the surface roughness. Optical parameters were examined by ultraviolet–visible (UV–Vis) spectrophotometer. Increasing sputtering power leads to a decrease in transparency value, an increase in absorbance, a reduction in penetration depth, a red shift of the fundamental absorption edge, and a reduction in the band gap energy from 3.06 eV to 2.61 eV. The annealed films exhibit a smaller optical band gap compared to as-deposited films in the range of 2.44 eV–2.93 eV. The temperature dependence of the sheet resistance corresponds to the Arrhenius law for as-deposited films with DC power of 10 W–30 W, indicating semiconducting nature. A decreasing trend in activation energy (0.283–0.055 eV) was observed with increasing DC power. All the annealed films exhibit insulator nature with a resistance of more than 100 MΩ. Analysis of these results suggests that the desired structural, optical, and electrical properties can be achieved by controlling deposition conditions.

Effect of nitrogen flow ratio on the structure and optical properties of AlN film

Aluminum nitride (AlN) films with different optical properties were prepared by radio frequency (RF) reactive magnetron sputtering technique under different nitrogen (N2) flow ratios. The films' microstructure and optical properties were investigated by XRD, XPS, SEM, UV-VIS and PL. The results showed that all the prepared films had hexagonal wurtzite structure and the sample prepared at 35 % N2 flow ratio obtained higher crystal quality and larger grain size (39 nm). The selective orientation of the films changed from (100) to (002) with the N2 flow ratio, accompanied with a surface morphology changed from worm-like to mixed structure, and eventually to a very regular pebble shape with a compact arrangement. The average transmission of the films exceeded 83 % in the wavelength range of 300–800 nm. The major internal defect affecting the band gap of AlN films was nitrogen-vacancy (VN), and the growth orientation and internal defects of AlN films were controlled by the N2 flow ratio to achieve the regulation of the energy band gap in a small range (5.47–5.68 eV). This can meet the requirement of solar-blind ultraviolet (<280 nm) photoelectric detection.

Impact of sputtering gas on the microstructural, mechanical and wetting properties of vanadium nitride coatings

Vanadium nitride (VN) coatings were deposited via reactive DC magnetron sputtering technique on a hot substrate (400 °C) with varying partial pressure of N2. The impact of nitrogen partial pressure on the crystal structure, microstructure, elemental composition, surface topography, mechanical and wetting properties of VN coatings was investigated using grazing incidence X-ray diffraction (GIXRD), Raman spectroscopy, field emission scanning electron microscope (FESEM), energy dispersive spectroscopy (EDS), atomic force microscope (AFM), nano-indentation, and drop shape analyzer (DSA). The variation in the N2 partial pressure leads the significant changes in the microstructure, mechanical and wetting properties of the coatings. The GIXRD spectra reveals the formation of crystalline FCC phase in the deposited VN coatings. However, at 100% N2 partial pressure, the preferred orientation of crystal planes changes from (200) to (220). The FESEM image reveals that at low N2 partial pressure, the coating exhibits well-separated grains with clearly visible grain boundaries. As the N2 partial pressure increases, the agglomeration of grains becomes more pronounced, and the grain boundaries become less discernible. However, at 100% N2 partial pressure, the structure transforms into triangular nanoflake-like prismatic structures with voids. The VN coatings with 60% N2 partial pressure exhibits the highest mechanical properties whereas at 100% N2 partial pressure, the VN coatings reveal super-hydrophilic character.

ZnO Deposition on Silicon and Porous Silicon Substrate via Radio Frequency Magnetron Sputtering

Nanostructured Zinc Oxide (ZnO) was deposited on silicon (c-Si) and macroporous silicon (m-PS) using a radio frequency (RF) reactive magnetron sputtering technique. Two RF powers of 60 and 80 W were selected for ZnO deposition on the substrates. Furthermore, the c-Si and m-PS substrate temperatures were kept at 500 and 800 °C, respectively. The morphological, structural, and optical characteristics of the samples were studied using scanning electron microscopy (SEM), an X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), and photoluminescence spectroscopy (PL). The SEM images revealed the formation of ZnO nanorods on the c-Si and ZnO nanostructures constituted by the assembly of nanorods. It has been found that the increasing RF sputtering power caused the rise in the residual stress. In addition, the increase in the deposition temperature caused an improvement in the arrangement of the crystals, which was attributed to the decrease in crystal defects.

CuO/TiO2 heterostructure-based sensors for conductometric NO2 and N2O gas detection at room temperature

Nitrous oxide (N2O) is hazardous gas extensively used in surgeries as an anesthetic and released into the atmosphere without any treatment. Despite low concentrations in the atmosphere, it has for 300 times larger warming coefficient to the greenhouse effect than CO2. There are only a few studies dedicated to the development of N2O gas sensors, but not for room temperature (RT) and ultra-low concentrations. In this study, we developed an ultrasensitive gas-sensing device operating at RT based on CuO/TiO2 heterojunctioned nanointerfaces prepared by scalable reactive magnetron sputtering technique with glancing angle deposition. The CuO/TiO2 heterojunctioned nanointerfaces demonstrated N2O gas sensitivity for ∼2 times higher than TiO2 mono-layer, and the device exhibits an outstanding detection limit of 50 ppb at RT, quick response and recovery times (∼36 s and ∼50 s). The ultrasensitivity of gas sensor is achieved by providing control over nanoarchitecture and comparable size of the nanorods-like structure to the doubled Debye lengths (∼70–80 nm). The applied nanoarchitecture design opens a flexible platform for different gas sensing devices where the array of p-n heterojunction nanorods was utilized efficiently and with technological simplicity. The statistical analysis of variances shows that obtained data is more confident and reproducible.

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering.

Hafnium oxide films were deposited on sapphire and silicon (100) substrates using the DC reactive magnetron sputtering technique from a pure hafnium target at different discharge power levels. The influence of the cathode power on the chemical composition, morphology, crystallographic structure and optical properties of the films was investigated. X-ray diffraction (XRD), energy dispersive X-ray analysis (EDX) and Fourier-transform infrared spectroscopy (FTIR) were employed to determine the chemical composition and bonding structure. In all cases, the films were found to be amorphous or nanocrystalline with increased crystalline content as the sputtering power was increased, according to XRD and FTIR. In addition, EDX showed that the films were oxygen-rich. The effect of power deposition on the surface topography and morphology of the films was studied using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The AFM and SEM images revealed the emergence of mound morphologies as the cathode power was increased. These features are related to blistering effects probably due to the presence of stress and its promotion within the film thickness. Finally, the optical properties showed an average transmission of 80% in the visible range, and the refractive index determined by spectral ellipsometry (SE) was found to be in the range of 1.85-1.92, close to the reported bulk value. SE was also used to study the film porosity observed by SEM, which can be related to the oxygen-rich character of the films.

Growth of Nanocolumnar TiO2 Bilayer by Direct Current Reactive Magnetron Sputtering in Glancing-Angle Deposition Configuration for High-Quality Electron Transport Layer.

The electron transport layer (ETL) plays a crucial role in solar cell technology, particularly in perovskite solar cells (PSCs), where nanostructured TiO2 films have been investigated as superior ETLs compared to compact TiO2. In this study, we explored the nanocolumnar growth of TiO2 in the anatase phase for bilayer thin films by DC reactive magnetron sputtering (MS) technique and glancing-angle deposition (GLAD). For the growth of the compact TiO2 layer, it was found that the crystalline quality of the films is strongly dependent on the sputtering power, and the samples deposited at 120 and 140 W are those with the best crystalline quality. However, for the nanocolumnar layer, the reactive atmosphere composition determined the best crystalline properties. By optimizing the growth parameters, the formation of TiO2 nanocolumns with a cross-sectional diameter ranging from 50 to 75 nm was achieved. The average thickness of the films exceeded 12.71 ± 0.5 µm. All nanostructured films were grown at a constant GLAD angle of 70°, and after deposition, the measured inclination angle of the nanocolumns is very close to this, having values between 68 and 80°. Furthermore, a correlation was observed between the quality of the initial layer and the enhanced growth of the TiO2 nanocolumns. All bilayer films are highly transparent, allowing light to pass through up to 90%, and present a band gap with values between 3.7 and 3.8 eV. This article offers the experimental parameters for the fabrication of a nanocolumnar TiO2 using the magnetron sputtering technique and the glancing-angle deposition configuration.

Tribocorrosion-Resistant Surface for TiO2 as a Function of Load and Sliding Speed

The applications projected in the coatings are in implants with the lower extremities since they require a great load capacity and are essential for walking. Therefore, the use of devices or implants is necessary for recovery, osteosynthesis, and fixation. The tribocorrosive behavior of nanostructured compounds based on titanium oxide with an intermediate layer of gold deposited on titanium substrates was determined. These coatings were obtained using the reactive magnetron sputtering technique. Tribocorrosive properties were evaluated at sliding speeds of 3500 mm/min, 4500 mm/min, 6000 mm/min, 7500 mm/min, and 9000 mm/min with loads of 1 N, 2 N, 3 N, 4 N, and 5 N. The coatings were characterized by X-ray photoemission spectroscopy and X-ray diffraction, and the surface roughness was analyzed by atomic force microscopy. The dual mechanical and electrochemical wear tests were carried out with a potentiostat coupled to a pin on the disk system. The system was in contact with a hanks solution (37 °C), which acted as a lubricant. Structural characterization made it possible to identify the TiO2 compound. In the morphological characterization, it was found that the substrate influenced the surface properties of the coatings. The tribological behavior estimated by the wear rates showed less wear at higher load and sliding speeds. It was shown that it is possible to obtain coatings with better electrochemical and tribological performance by controlling the applied load and slip speed variables. In this study, a significant decrease corresponding to 64% was obtained, specifically in the speed of deterioration, and especially for a load of 5 N, depending on the sliding speed that went from 0.2831 mpy (Mils penetration per year) to 3500 mm/min compared to 0.1045 mpy at 9000 mm/min, which is explained by the mechanical blockage induced by the coating.

The stress release of morphological change on thermochromic properties of nitrogen-incorporated VO2 thin films

VO2 thin films are fabricated by the reactive high power impulse magnetron sputtering technique. Their thermochromic properties are found to be greatly affected by the addition of nitrogen during the deposition process. These include an effect of localized surface plasmon resonance due to isolated island structures. Furthermore, low transition temperatures below 45 °C are observed due to oxygen-deficient conditions. Also, the transition temperature decreases with an increase in the thickness of the TiO2 buffer layer. The reduction in transition temperature could be as low as 39 °C with a solar modulating ability of 4% at a thicker buffer of 300 nm under a high gas ratio of 21.7% for nitrogen. The crystalline phase is identified by x-ray diffraction, showing that the intensity of monoclinic crystallites at a diffraction angle of 2θ = 27.8° for (011) phase decreases with an increase in the amount of nitrogen, whereas a relaxing shift is detected near the diffraction angle of 2θ = 37.0° for (2¯11) phase. Similar behavior is seen in the peak shift of the (004) phase for TiO2. The d-spacing of the crystallization phase with island structure is identified by high-resolution transmission electron microscopy. The evolution of stress release, which is strongly dependent on surface morphology, is consistent with x-ray pole figure representation. The visible transmittance and solar modulation ability as functions of the amount of nitrogen and the buffer thickness of TiO2 are discussed.

C-TiO2+Ni and ZnO+Ni Magnetic Photocatalyst Powder Synthesis by Reactive Magnetron Sputtering Technique and Their Application for Bacteria Inactivation

In the current study, a bi-layered magnetic photocatalyst powder consisting of a Ni layer on one side and carbon-doped TiO2 or ZnO photocatalyst layers on the other side was synthesized by magnetron sputtering technique. SEM, XRD, and XPS analysis of powders revealed that the photocatalytic TiO2 layer had a mixed anatase-rutile structure, was doped by carbon to approximately 3 at. % and had a fraction of Ti(III) oxide. Meanwhile, the ZnO layer was crystalized in a wurtzite structure and had a considerable number of intrinsic defects, which are useful for visible light photocatalysis. The activity of magnetic photocatalyst powder was tested by photocatalytic bleaching of dyes, as well as performing photocatalytic inactivation of Salmonella bacteria under UV and visible light irradiation. It was observed, that C-TiO2+Ni magnetic photocatalyst had relatively high and stable activity under both light sources (for five consecutive cycles dye degradation reached approximately 95%), but ZnO+Ni was generally lacking in activity and stability (over five cycles under UV and visible light, dye degradation fell from approximately 60% to 55% and from 90% to 70%, respectively). Photocatalytic treatment of bacteria also provided mixed results. On one hand, in all tests bacteria were not inactivated completely. However, on the other hand, their susceptibility to antibiotics increased significantly.

Effects of Y addition on the microstructures and mechanical behavior of ZrOxNy/V2O3-Y nano-multilayered films

ZrOxNy/V2O3-Y nano-multilayered films with various yttrium additions were deposited on a Si substrate by reactive magnetron sputtering technique. The influences of yttrium addition on the microstructures, strengthening, and toughening characteristics of the nano-multilayered films were examined by the X-Ray diffraction, X-ray photoelectron spectroscopy, electro-probe microanalyzer, scanning electron microscopy, transmission electron microscopy, selected area electron diffraction, and nanoindentation instrument. The experimental results showed that the template and modulation layers of the ZrOxNy/V2O3-Y nano-multilayered films consisted of ZrO2, ZrON, ZrN, and V2O3, Y2O3, respectively. Under the role of the template layer, the modulation layer maintained the epitaxial growth, which formed a coherent interface structure between the two sublayers as a function of the yttrium addition. When the Y/VO2 ratio was 1/2, the hardness, elastic modulus, and fracture toughness value could reach 15.1 GPa, 182.2 GPa, and 1.23 MPa m1/2, respectively. The incorporation of yttrium atoms gave rise to the phase transition, and the coherent interface inhibited the dislocation movement during nanoindentation loading, thus contributing to the optimal mechanical behavior of the ZrOxNy/V2O3-Y nano-multilayered films.

Spectroscopic characteristics of highly pure metal oxide nanostructures prepared by DC reactive magnetron sputtering technique

Spectroscopic characteristics of highly pure metal oxide nanostructures prepared by DC reactive magnetron sputtering technique