The preparation of thin film radiation sources using radiofrequency-sputtering techniques has been demonstrated. 241Am alpha photon and photon radiation sources have been prepared using a radiofrequency-sputtering system, installed in a glove box designed to maintain radioisotope containment. Sources prepared using radiofrequency sputtering to deposit the radioactive layer and also the isotope containment layer have been evaluated for uniformity, activity, and integrity with generally positive results. Up to 25 radiation sources having a 0.5 in. diam. active layer have been prepared in a single run. Planar ring sources and other geometry sources may be conveniently prepared. The use of sputtering for source preparation is most applicable when several sources are prepared in a run, and when there is a continuing demand for sources containing a given radioisotope.
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