The thicknesses of aluminum, copper, and gold thin films on silicon substrates have been measured with an electron probe microanalyzer. k ratio versus thickness calibration curves are obtained by a Monte Carlo simulation of electron scattering. The simulation results based on two energy loss models are compared. One is the continuous slowing down approximation model and another is the hybrid model for the discrete and the continuous energy loss processes. Inner shell ionizations and free electron excitations are selected out for the discrete process in the hybrid model. In both models the Mott cross section and the Gryzinski cross section are used for elastic collisions and ionizations, respectively. The exact film/substrate boundary condition is considered. The characteristic and continuum fluorescence corrections are also included in the simulation. The simulation results agree well with experimental ones measured with a quartz oscillator. Effects of the introduction of the discrete energy loss process and the fluorescence correction are discussed in comparison between simulation and experiment.
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