Lewis acid–base interactions between SiF 4 and a wide range of molecular negative ions are reported here for the first time. The molecular anions include those formed by simple electron attachment to p-benzoquinone, benzophenone, nitrobenzene, and 21 substituted nitrobenzenes and also include the o- and p-nitrophenoxy anions. From measurements performed by pulsed electron-beam high pressure mass spectrometry, equilibrium constants and free energies for the association reactions, M − + SiF 4 ⇌ M −(SiF 4), at 150 °C are reported for each of the molecular anions, M −. It is shown that the strengths of these Lewis acid–base interactions of SiF 4 are much greater than ion–dipole interactions previously reported between these molecular anions and several common solvent molecules of relatively high dipole moment, including methanol, acetonitrile, dimethylformamide, and dimethlysulfoxide. The strengths of the Lewis acid–base interactions of SiF 4 with molecular anions show a strong inverse dependence on the electron affinity of the parent molecule and on the availability of a specific Lewis base site on the molecular anion that can be closely approached by the central Si atom of SiF 4. It is also shown that strong interactions between SiF 4 and the molecular anions derived from compounds of very low electron affinity can be gainfully used for the trace detection of such compounds by electron capture mass spectrometry.
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