Pulsed Electron Beam Ablation Research Articles

Field escalation effect in the pulsed ion beam sources based on the pseudospark discharge

The great potential of the pseudospark has resulted in a significant extension of the applications of the intense pulsed particle beam sources, the high-power switching technology, and film deposition with pulsed electron beam ablation, etc. The discharge mechanism of the pseudospark multiplate chamber has been successfully explained by using the field escalation effect. The pseudospark takes place in the left-hand region of Paschen’s breakdown curve under low-pressure gas. The positive space charge accumulation in the initial glow-like discharge phase leads to the rapid local field enhancement near the protrusion surface of the cathode hole. The intense pulsed electron beams, as well as the ion beams with high charge states and high current density, have been extracted from both the anode hole and the cathode hole.