The properties of chain ignition of silane (SiH/sub 4/) gas have been studied under reduced pressures by several previous researchers, but the flame properties at ordinary pressures seem to be very rarely studied in spite of the fact that this gas is now widely used in semiconductor manufacture. Very recently other researchers reported a counterflow diffusion flame technique applied to studying the SiO/sub x/ formation from silane in the flame of H/sub 2//O/sub 2/, but the properties of self sustaining flames of silane itself with air are not made clear.