Particle precipitation-aided chemical vapor deposition (PP-CVD) is a modification of the conventional CVD process, where an aerosol is formed in the gas phase at an elevated temperature, and particles are deposited on a cooled substrate. The synthesis of titanium nitride (TiN), using titanium tetrachloride vapor (TiCl4), nitrogen (N2), ammonia (NH3), and hydrogen (H2), by the PP-CVD process is studied. TiN is formed by a heterogeneous reaction, using TiCl4, N2, H2, whereas simultaneously TiCl4 and NH3 react to form an aerosol. The activation energy of this homogeneous reaction is on the order of 100 kJ/mol. The powder formation process is determined by the dissociation of a titanium containing intermediate species. At low temperature differences between substrate and gas phase (i.e., < 2 K), only dense columnar microstructures, with growth rates of around 20 μm/h, are observed. At these temperature differences no particle deposition is observed. The layers are formed by a molecular diffusion controlled CV...