AbstractImpacts of point defects and impurities on the recombination dynamics for the near‐band‐edge (NBE) emission in AlN and high AlN mole fraction AlxGa1‐xN epilayers are revealed by means of deep ultraviolet (DUV) time‐resolved luminescence and positron annihilation measurements. Extremely radiative nature of AlN is identified, as the radiative lifetime (τR) for a free excitonic polariton emission is as short as 10 ps at 7 K and 180 ps at 300 K, which are the shortest ever reported for spontaneous emission of bulk semiconductors. However, τR increases with the increase in impurity and Al‐vacancy (VAl) concentrations up to 530 ps at 7 K, irrespective of the threading dislocation (TD) density. Continuous decrease in τR with temperature rise up to 200 K for heavily‐doped samples may reflect the carrier release from band‐tail states. Similar to these AlN, low‐temperature τR for low‐temperature‐grown high‐x AlxGa1‐xN are longer than that for low‐x AlxGa1‐xN, AlN, or GaN due to the contribution of bound and localized tail‐states. However, τR shows little change with temperature rise, and is still a few ns at 300 K. The results essentially indicate an excellent radiative performance, although the luminescence efficiency of AlN and AlxGa1‐xN DUV light‐emitting‐diodes (LEDs) reported so far is limited by short nonradiative lifetimes (τNR). To increase τNR, high temperature growth with appropriate defect management is preferable (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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