The dissociation of O[sub 2] and NO[sub 2] on Zn/Ru(001) surfaces and the properties of the resulting ZnO[sub x] adlayers have been investigated using TDS, XPS, and XAES. For submonolayer coverages of O and Zn on Ru(001), there is no lateral bonding between the adatoms. In these cases, strong Ru [leftrightarrow] O and Ru [leftrightarrow] Zn interactions prevent the formation of Zn-O bonds. ZnO[sub x] films were observed after increasing the Zn and O coverage above 1 monolayer. Some of these films displayed the typical O(1s) XPS and Zn L[sub 3]M[sub 45]M[sub 45] Auger spectra of polycrystalline ZnO, decomposing at temperatures between 800 and 1,050 K. At 80 K, the initial dissociation probability of O[sub 2] on Zn[sub 1.0]/Ru(001) is almost 2 orders of magnitude smaller than that on polycrystalline Zn. This reduction in the rate of O[sub 2] dissociation is accompanied by a change in the type of oxygen formed: for the supported Zn monolayer, surface oxygen predominates; whereas for pure Zn, oxygen incorporated into the bulk of the film is the dominant species. The dissociation of NO[sub 2] is similar on Zn[sub 1.0]/Ru(001) and polycrystalline Zn. At 80 K, the initial NO[sub 2] adsorption is dissociative: NO[sub 2,g]more » [yields] NO[sub g] + O[sub a]. The oxygen adatoms passivate the surface, and the subsequent adsorption of NO[sub 2] is molecular. Chemisorbed NO[sub 2] decomposes at temperatures between 160 and 250 K to yield gaseous NO and oxygen atoms that remain on the surface (Zn[sub 1.0]/Ru(001) case) or migrate into the bulk (pure Zn case). At 300 K, the probability for dissociation of NO[sub 2] on Zn surfaces is 2 orders of magnitude larger than the probability for dissociation of O[sub 2]. 61 refs., 14 figs., 1 tab.« less