Far-infrared reflectivity measurements have been carried out from \ensuremath{\sim}40 to 320 ${\mathrm{cm}}^{\ensuremath{-}1}$ on a ${\mathrm{Pb}}_{0.88}$${\mathrm{Sn}}_{0.12}$$\mathrm{Te}$ epitaxial film of low carrier concentration ($p\ensuremath{\sim}{10}^{16}$ ${\mathrm{cm}}^{\ensuremath{-}3}$) on a high-carrier-density ($p\ensuremath{\sim}{10}^{18}$ ${\mathrm{cm}}^{\ensuremath{-}3}$) ${\mathrm{Pb}}_{0.78}$${\mathrm{Sn}}_{0.22}$Te substrate. The reflectivity data were analyzed using a two-oscillator dielectric function including free-carrier and phonon linewidths. An upper bound for the LO-phonon frequency was determined to be 115.7 ${\mathrm{cm}}^{\ensuremath{-}1}$ at room temperature and 113.5 ${\mathrm{cm}}^{\ensuremath{-}1}$ at liquid-${\mathrm{N}}_{2}$ temperature. Other parameters obtained were the phonon linewidth $\ensuremath{\gamma}=19$ ${\mathrm{cm}}^{\ensuremath{-}1}$ at room temperature and 12 ${\mathrm{cm}}^{\ensuremath{-}1}$ at liquid-${\mathrm{N}}_{2}$ temperature, and the substrate free-carrier linewidth $\ensuremath{\nu}=81$ ${\mathrm{cm}}^{\ensuremath{-}1}$ at room temperature and \ensuremath{\sim}70 ${\mathrm{cm}}^{\ensuremath{-}1}$ at liquid-${\mathrm{N}}_{2}$ temperature. An analysis of the oscillatory behavior of the reflectivity at frequencies above the highest plasmon-phonon mode permitted the determination of the spatial variation of carrier concentration in the region of the film-substrate interface.