Physical Vapor Deposition Technique Research Articles

Design, fabrication and characterization of MoS2self-lubricating pure MoS2Coatings for space applications using PVD magnetron sputtering

Tribological components cost just a fraction of the whole spacecraft, but they often lead to failures that partially or completely disrupt the spacecraft. Mechanical components used in space applications have to withstand extreme and severe environmental conditions such as very high or very low cryogenic temperatures, high vacuum, corrosive elements and radiation. MoS2 is the most widely used lubricating material in space applications. It possesses a lamellar structure with strong covalent bonds within layers and simultaneously weak van der Wall’s interlayer bonds, resulting in easy shearing of the crystals in the direction parallel to the basal planes, hence acting as a good solid lubricant.In this research, a thin film nano scale coating of MoS2 was deposited on steel using Physical Vapour Deposition (PVD). The PVD technique used was the RF magnetron sputtering process. Material characterization was performed using X-Ray diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM) and Raman spectroscopy. According to the results, the developed MoS2 nano coatings have a polycrystalline structure with basal planes that are oriented perpendicular to the substrate surface.

Morphology, electrical & optical properties of BaO thin films deposited by PVD

In this work, we explore a new experimental study of Barium oxide (BaO) thin films, fabricated using the physical vapor deposition (PVD) technique on both glass and silicon substrates. The BaO thin films have emerged as highly adaptable materials with immense potential across multiple technological domains. The investigation focuses on the morphological, optical, and electrical properties of BaO thin films to determine their potential for various applications. These films, consistently tailored to a thickness of 100 nm, exhibit exceptional optical properties, boasting an impressive transmittance rate of up to 90%. This makes them exceptionally well-suited for applications that demand superior optical transmission, such as flat-panel displays, photovoltaic devices, and various optoelectronic applications. The films’ low roughness values, measured at 6.31 nm for glass-deposited films and 13.32 nm for silicone-deposited ones, underscore their uniformity, ensuring stable and precise performance control in diverse applications. Further underscoring their versatility is the wide energy gap of 2.93 eV, suggesting their potential utility in advanced optoelectronic devices that require higher energy levels. In addition to their optical prowess, BaO thin films exhibit impressive electrical resistance, measuring at 3.3 × 108 ohms, rendering them promising candidates for specialized applications, including pressure and humidity sensors, as well as electrical insulation devices. Overall, these films represent an exciting avenue for addressing specific technological needs and driving innovation in the realm of thin film technology.

Process parameters and TiAlN coating impact on microwire-EDM of Ti6Al4V using PVD technique in biomedical application

The growing demand for products made of cutting-edge materials with increased attributes motivates material scientists to investigate prospective variants of such materials. Among the various categories of life-saving advanced materials are biomaterials, although shaping most of them according to the needs encounter manufacturing constraints due to their specific mechanical properties. For example, the extremely tough alloy Ti6Al4V, is renowned for its outstanding mechanical compatibility with the human body. Nonconventional means of machining have gained popularity keeping focus on the challenging machining circumstances that are well-known for their very precision and machining accuracy, no matter what type, shape, or hardness is being machined. Electrical discharge machining (EDM), for example, is the most prevalent efficient means of material removal, along with wire EDM (WEDM), [Formula: see text]-WEDM, and so on. Excess material should be removed for more particular applications of complex and baroque shapes, with a high degree of smoothing and finish, is one of the most advantageous characteristics of wedding metal dielectric material ([Formula: see text]-WEDM). In this study, we examined the effect of variable pulse-on (Ton), pulse (Toff), time (to), flushing pressure (FP), wire feed rate (WFR), wire tension (WT), voltage (SV), and peak current (PC) on [Formula: see text]-WEDM’s reliability of the machined section (SR) using physical vapor deposition (PVD) technique to deposit aluminium nitride (TiAlN) coating on the surface of the metal. The results demonstrate a substantial reduction in roughness in the mechanically produced surfaces, further demonstrating, and confirming the biocompatibility of metals dielectric materials ([Formula: see text]-WEDM) with tissues within the human body.

Machine Learning-Based Characterization of the Nanostructure in a Combinatorial Co-Cr-Fe-Ni Compositionally Complex Alloy Film.

A novel artificial intelligence-assisted evaluation of the X-ray diffraction (XRD) peak profiles was elaborated for the characterization of the nanocrystallite microstructure in a combinatorial Co-Cr-Fe-Ni compositionally complex alloy (CCA) film. The layer was produced by a multiple beam sputtering physical vapor deposition (PVD) technique on a Si single crystal substrate with the diameter of about 10 cm. This new processing technique is able to produce combinatorial CCA films where the elemental concentrations vary in a wide range on the disk surface. The most important benefit of the combinatorial sample is that it can be used for the study of the correlation between the chemical composition and the microstructure on a single specimen. The microstructure can be characterized quickly in many points on the disk surface using synchrotron XRD. However, the evaluation of the diffraction patterns for the crystallite size and the density of lattice defects (e.g., dislocations and twin faults) using X-ray line profile analysis (XLPA) is not possible in a reasonable amount of time due to the large number (hundreds) of XRD patterns. In the present study, a machine learning-based X-ray line profile analysis (ML-XLPA) was developed and tested on the combinatorial Co-Cr-Fe-Ni film. The new method is able to produce maps of the characteristic parameters of the nanostructure (crystallite size, defect densities) on the disk surface very quickly. Since the novel technique was developed and tested only for face-centered cubic (FCC) structures, additional work is required for the extension of its applicability to other materials. Nevertheless, to the knowledge of the authors, this is the first ML-XLPA evaluation method in the literature, which can pave the way for further development of this methodology.

Fabrication of Superhydrophobic Surfaces Using Inverted Glancing Angle Deposition (I-GLAD)

Abstract This paper presents a novel approach for fabricating superhydrophobic surfaces using inverted glancing angle deposition (I-GLAD). GLAD is an advanced physical vapor deposition technique that utilizes substrate tilt and rotation to create three-dimensional nanofeature arrays. Unlike conventional top-down nanofabrication methods, GLAD offers unique advantages in generating various nanofeatures such as pillars, springs, chevrons, ribbons, and nanoporous membranes. Superhydrophobicity, inspired by natural examples like lotus leaves and cicada wings, relies on highly porous micro/nanostructures that reduce surface energy and impart water-repellent properties. GLAD’s capability to produce hierarchical and porous nanostructures makes it an ideal candidate for superhydrophobic surface fabrication. Previous researches have proposed GLAD processes for superhydrophobic surfaces; however, these approaches suffer from flaws such as being time-consuming or requiring challenging template assistance. In this paper, we introduce a new I-GLAD approach for creating superhydrophobic surfaces that eliminates the need for a seeding layer and an additional coating, simplifying the fabrication process. The fabrication process of I-GLAD includes natural seeding, growing, capping, and inverting. The resulting superhydrophobic surfaces exhibit a high water contact angle of over 155 deg. We further explore additional GLAD recipes to create surfaces with different water contact angles, enabling a comprehensive analysis of superhydrophobic properties. Potential applications for superhydrophobic surfaces include anti-icing coatings, self-cleaning surfaces, and antimicrobial surfaces.

Thin-Film Lithium Cobalt Oxide for Lithium-Ion Batteries

Lithium cobalt oxide (LCO) cathode has been widely applied in 3C products (computer, communication, and consumer), and LCO films are currently the most promising cathode materials for thin-film lithium batteries (TFBs) due to their high volumetric energy density and favorable durability. Most LCO thin films are fabricated by physical vapor deposition (PVD) techniques, while the influence of preparation on the materials’ properties and electrochemical performance has not been highlighted. In this review, the dominant effects (heating, substrate, power, atmosphere, etc.) on LCO thin films are summarized, and the LCO thin films fabricated by other techniques (spin coating, sol–gel, atomic layer deposition, pulsed laser deposition, etc.) are outlined. Moreover, the modification strategies including bulk doping and surface coating for powder and thin-film LCO electrodes are discussed in detail. This review may pave the way for developing novel, durable, and high-performance LCO thin films by versatile methods for TFB and other energy storage devices.

Synthesis, structural, TD-DFT, and optical characteristics of indole derivatives

New compounds of (E)-1-(3-chloro-1H-indol-2-yl)-N-(4-methoxyphenyl)methanimine [Indol-M] and (E)-1-(4-(((3-chloro-1H-indol-2-yl)methylene)amino)phenyl)ethan-1-one [Indol-A] were synthesized and subsequently converted to thin films via physical vapor deposition technique. Numerous characterization techniques were used including FTIR, nuclear magnetic resonance, X-ray diffraction, scanning electron microscope, and optical spectroscopy. Additionally, the optimization using TD-DFTD/Mol3 and Cambridge Serial Total Energy Bundle (TD-FDT/CASTEP) was performed. The XRD and FTIR spectra recorded experimentally were confirmed by TD-DFT calculations, proving their molecular structure. As determined by XRD, the crystallite size of [Indol-M]TF and [Indol-A]TF is 72.26 and 62.05 nm, respectively. SEM image depicts a one-dimensional morphological structure made up of tightly packed nanorods. The direct optical energy bandgaps computed using Tauc's equation for the [Indol-M]TF and [Indol-A]TF are 4.49 eV and 3.31 eV, respectively. As predicted by CASTEP TD-DFT, the optical properties agree well with the experimental values. [Indol-M]TF and [Indol-A]TF present good candidates for optoelectronics and solar cell applications.

Fatigue crack behaviour of composite- and mono-coated marine structural components

ABSTRACT In this study, experimental and numerical studies of fatigue crack growth (FCG) mechanisms in coated and uncoated structural components of EN8 steel (EN8) and aluminium alloy 6063 (AA6063) samples were compared. Electroplating (EP) (of nickel (Ni) and chromium (Cr)) and physical vapour deposition technique (PVD) (of aluminium nitride (Al-N) and nanocrystalline layers of titanium aluminium nitride (Ti-Al-N)) methods were used for mono and composite metallic coatings of EN8 and AA6063. The present study focuses on the implications of the coating-substrate interface during FCG initiation and propagation by considering the loading-bearing ability of the coating. Fatigue cracking mechanism depends on coating fracture toughness (FT) at the interface of mono-composite coating and its thickness. In comparison, composite-coated PVD samples proved better than mono-coated electroplated samples due to the delayed plastic deformation process on the surface of the substrate sample.

Optical Properties and Moisture Stability of HfO2 Thin Films Prepared by Ion Assisted Deposition for UV Applications

In this study the progress in the realization of environmentally stable, high phase thickness, long-pass edge filters for UV applications is reported. These filters are characterized by extremely sharp transitions from full transmittance to deep blocking. Such filters are manufactured via physical vapor deposition of Hafnia (HfO2). Filters with highest phase thickness exhibit the steepest edge slopes. In this work we produce two types of filters, the first one manufactured using Ion Assisted Deposition (IAD), and the second one prepared by Physical Vapor Deposition (PVD) technique. When comparing the results for moisture stability of edge filters produced by IAD and PVD, it is found that the filters produced with ion assist exhibit wet-dry shifts in edge wavelength location less than 0.05%.

Fabrication and characterization of thin 116Cd target films for fusion measurements

Fabrication and characterization of thin target films of 116Cd by physical vapour deposition technique are reported. The target films were used in the study of nuclear fusion dynamics near the Coulomb barrier with a beam of 16O. Because of the low melting point of cadmium and its re-evaporation after deposition, coupled with availability of a very small quantity of isotopically enriched material, an unconventional method was employed to fabricate the targets. The prepared target films were characterized using Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Spectroscopy (EDS), X-ray Diffractometry (XRD) and Rutherford Back-scattering Spectroscopy (RBS) to obtain their surface morphology, elemental composition, chemical composition and thickness, respectively. Thickness of the enriched target films were in the range of 20 –50 μg/cm2. Isotopic composition of one of the target films was ascertained in an in-beam experiment using a recoil mass spectrometer. It was observed that abundance of 116Cd in the fabricated target film was significantly lower than the value quoted by the supplier of the source material.

Tribological and Mechanical Properties of the Nanostructured Superlattice Coatings with Respect to Surface Texture

Ceramic Nanostructured Superlattice Coatings (NSC) have broad applicability to improve the parts’ and assemblies’ tribological and mechanical properties for the needs of the automotive and aerospace industries. Improving the material properties using nanocoatings for such a widely used material as, for example, bearing steel 100Cr6 makes it possible to improve the service life of machine parts. In this paper, the correlation dependence between tribological and mechanical properties of the NSC and its surface texture are considered to determine how much surface texture will affect the tribological performance of the coated workpieces, as well as the measuring and evaluation procedure of the nanocoatings, are presented. Three different NSC described by a general empirical formula {TiMe1Me2-CN/TiAlSi-N}n and based on the modified carbonitride/nitride non-stoichiometric chemical composition were created, and their tribological and mechanical properties measured and analyzed in the context with surface texture. NSC deposited by the advanced PVD (Physical vapor deposition) technique demonstrated significantly higher wear resistance (up to 28 times), reasonably lower friction coefficient (CoF) (up to 4 times), and significantly higher hardness of the coated workpieces (up to 7 times) versus substrate material. A strong correlation between the steady-state dry sliding friction, CoF, and the amplitude and functional surface texture parameters of tribo-track were observed. The first results of the initiated research regarding the correlation analysis of the tribological and mechanical properties, on the one hand, and surface texture, on the other hand, of the NSC are reported here.

Vacancy-type defects in TiN/ZrO2/TiN capacitors probed by monoenergetic positron beams

TiN/ZrO2/TiN capacitors were fabricated by using a physical vapor deposition technique, and their microstructures were characterized using X-ray diffraction, a scanning transmission electron microscope, energy-dispersive X-ray spectroscopy, and monoenergetic positron beams. After the deposition of a 10-nm-thick ZrO2 layer on the top TiN layer, a defect-rich interlayer was formed in the ZrO2 layer. After post-deposition annealing at 550°C, the width of the interlayer expanded toward the center of the ZrO2 layer. The major vacancy-type defects in the ZrO2 layer were determined to be a Zr-vacancy coupled with oxygen vacancies. After annealing, the size of the vacancies increased, and it was close to the open spaces in amorphous high-k materials. The presence of such vacancy-type defects in the ZrO2 layer suggests that not only oxygen vacancies but also cation vacancies play an important role in the defect formation of the ZrO2 layer and affect its electrical properties. The introduction of the interlayer and defect-rich region was suppressed by annealing with the top TiN layer. The leakage current mechanism of the capacitor is discussed in terms of vacancy-type defects in the ZrO2 layer.

An experimentally driven high-throughput approach to design refractory high-entropy alloys

High-entropy alloy (HEA) design strategies have been limited to theoretical/computational approaches due to their compositional complexity and extremely large compositional parameter space. In this work, we developed an experimentally driven, high-throughput, HEA design approach using a physical vapor deposition (PVD) technique and coupled it with nanomechanical testing to accelerate material design for structural applications. The PVD technique enabled the formation of a compositional gradient across a thin-film sample. Specifically, a 10 cm wafer was used to manufacture a continuous set of 80 HEA compositions within the Nb-Ti-V-Zr family using a single deposition cycle. By using the solid-solution strengthening theory and estimated parameter properties, the strength and ductility of these HEA compositions were quantitatively determined/predicted and then experimentally verified by nano-indentation hardness test. Consequently, 7 refractory HEA compositions were successfully down-selected, which has a high propensity to have a balanced mechanical property.

CISS-Based Label-Free Novel Electrochemical Impedimetric Detection of UVC-Induced DNA Damage.

In this work, we demonstrate chiral-induced spin selectivity (CISS)-based label-free electrochemical impedimetric detection of radiation-induced DNA damage using the electrons’ spin as a novel tool of sensing. For this, self-assembled monolayers (SAMs) of short ds-DNA (of length 7.14 nm) are prepared on arrays of multilayer thin film devices comprising a gold overlay (500 μm diameter with 10 nm thickness) on a nickel thin film (100 nm) fabricated by the physical vapor deposition technique. Subsequently, the SAMs of ds-DNA are exposed to ultraviolet C (UVC) radiation for a prolonged period of 8 h to induce structural perturbations in DNA. The susceptibility of DNA to radiation-induced damage was probed by recording the spin-dependent electrochemical impedimetric spectra, wherein a continuous sinusoidal wave of the amplitude of 10 mV was superimposed on DC bias in the frequency range of 100–105 Hz, with simultaneous spin injection through the attached DNA. The inherent correlation between the charge-transfer resistance (Rct) and the spin selectivity of electrons through DNA was taken into account for the detection of DNA damage for the first time with a limit of detection achieved up to 10 picomolar concentrations of DNA. As the spin-polarized electrons directly probe the structural symmetry, it is robust against perturbation from electronic signals usually found in conventional electrochemical biosensors.

Nanostructured MoS2 and WS2 Photoresponses under Gas Stimuli.

This study was on the optoelectronic properties of multilayered two-dimensional MoS2 and WS2 materials on a silicon substrate using sputtering physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques. For the first time, we report ultraviolet (UV) photoresponses under air, CO2, and O2 environments at different flow rates. The electrical Hall effect measurement showed the existence of MoS2 (n-type)/Si (p-type) and WS2 (P-type)/Si (p-type) heterojunctions with a higher sheet carrier concentration of 5.50 × 105 cm−2 for WS2 thin film. The IV electrical results revealed that WS2 is more reactive than MoS2 film under different gas stimuli. WS2 film showed high stability under different bias voltages, even at zero bias voltage, due to the noticeably good carrier mobility of 29.8 × 102 cm2/V. WS2 film indicated a fast rise/decay time of 0.23/0.21 s under air while a faster response of 0.190/0.10 s under a CO2 environment was observed. Additionally, the external quantum efficiency of WS2 revealed a remarkable enhancement in the CO2 environment of 1.62 × 108 compared to MoS2 film with 6.74 × 106. According to our findings, the presence of CO2 on the surface of WS2 improves such optoelectronic properties as photocurrent gain, photoresponsivity, external quantum efficiency, and detectivity. These results indicate potential applications of WS2 as a photodetector under gas stimuli for future optoelectronic applications.

Proposed algorithm for the design of planar inductors in implantable biomedical devices

The AISI 316L steel is a material used to manufacture prostheses and medical instruments due to its high corrosion resistance. However, its wear resistance is low, but it can be improved by synthesizing thin films of titanium nitride (TiN) on the surface. This compound is a hard material that improves its tribological and corrosive properties, in addition to presenting good adhesion to the substrate. In this work, a Ti/TiN thin film was obtained using the Physical Vapor Deposition (PVD) technique. This coating was characterized by scanning electron microscopy, energy dispersion spectroscopy (EDS), and light microscopy; additionally, tribological tests under wet conditions and adhesion tests were conducted. The coating showed good adhesion to the substrate according to the VDI standard. In tribological tests, a low coefficient of friction vs. a polyethylene pin in a wet environment (bovine serum) was obtained. The EDS showed a high concentration of Ti and N on the substrate even after wear tests.

Adhesion and wear study on 316L steel coated with titanium nitride by PVD

The AISI 316L steel is a material used to manufacture prostheses and medical instruments due to its high corrosion resistance. However, its wear resistance is low, but it can be improved by synthesizing thin films of titanium nitride (TiN) on the surface. This compound is a hard material that improves its tribological and corrosive properties, in addition to presenting good adhesion to the substrate. In this work, a Ti/TiN thin film was obtained using the Physical Vapor Deposition (PVD) technique. This coating was characterized by scanning electron microscopy, energy dispersion spectroscopy (EDS), and light microscopy; additionally, tribological tests under wet conditions and adhesion tests were conducted. The coating showed good adhesion to the substrate according to the VDI standard. In tribological tests, a low coefficient of friction vs. a polyethylene pin in a wet environment (bovine serum) was obtained. The EDS showed a high concentration of Ti and N on the substrate even after wear tests.

Fabrication of Block Copolymer Templated Extended Surface Model Electrocatalysts By Atomic Layer Deposition and Physical Vapor Deposition

Templating platinum group metal (PGM) nanostructures from microphase separated block copolymers (BCPs) allows for electrocatalytic activity to be studied on highly ordered, model surfaces with precisely controlled feature sizes and morphologies, thereby allowing catalyst electroactivity and stability to be probed as a function of nanoscale geometry. In our previous work [1], BCP templated electrocatalysts fabricated via incipient wetness impregnation of PGM precursors were tested for hydrogen oxidation/evolution and water-splitting activity on interdigitated electrodes using liquid and solid polymer electrolytes. This talk presents the fabrication of such electrocatalysts via Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD) techniques (e-beam evaporation and sputtering). Self-assembled lamellae of poly-(styrene-block-methylmethacrylate) (PSbPMMA) thin films on Si wafer and glassy carbon substrates were subjected to 5 - 15 ALD cycles with trimethylaluminium (TMA) precursor to induce selective growth of alumina in the PMMA domains via Sequential Infiltration Synthesis. Thereafter, the polymer template was removed via Reactive Ion Etching (RIE) with oxygen plasma. The resultant alumina nanostructures templated from self-assembled PSbPMMA was then used as a substrate either for Platinum ALD with (trimethyl)methylcyclopentadienylplatinum(IV) precursor atop a Titanium Nitride adhesive layer, or for sputtering of Pt atop a Ti adhesive layer to obtain conformal Pt coatings of up to 20 nm in thickness. When e-beam evaporation was used, The PMMA domains were selectively removed by successive wet and dry etch steps, followed by deposition and lift-off. The PGM electrocatalyst nanostructures were characterized via a combination of electron microcopy, X-ray diffraction, and X-ray photoelectron spectroscopy, and the Pt content of the catalysts were determined via microwave leaching and digestion of the electrocatalyst thin film followed by Inductively Coupled Plasma Mass Spectroscopy. The nanostructured electrocatalysts were tested for oxygen reduction (ORR) activity in a conventional rotating disk electrode setup using 0.1 M perchloric acid electrolyte, and the ORR mass activities and active surface area were obtained.[1] Bhattacharya, D., Arges, C. G., et al., Small, 2021, 17, 2100437

Core-Shell Electrocatalysts with Nanocolumnar Pt Thin Film Shell on Carbon Support Core for Polymer Electrolyte Membrane Fuel Cells

Polymer Electrolyte Membrane Fuel Cell (PEMFC) is one of the most promising energy conversion technologies with zero carbon emission, and has received significant attention especially for automotive applications. State-of-the-art PEMFCs use platinum or platinum-alloy nanoparticles distributed on carbon as the electrocatalyst. However, there are still significant challenges for PEMFCs before widespread commercialization including short lifetime and high initial cost mainly originating from the catalyst related issues. Recent research efforts have focused on approaches that would improve catalyst lifetime, reduce its manufacturing cost, and reduce the amount of platinum used without losing activity. In this work, we present a new core-shell electrocatalyst design that can potentially address the challenges of conventional PEMFC catalysts. The design involves a shell of nanocolumnar Pt thin film coated on carbon support core (Pt-TF/C). Pt-TF layers were deposited on carbon powder by high-pressure sputtering (HIPS) and their oxygen reduction reaction (ORR) activity relevant to PEMFCs was investigated. HIPS is a simple physical vapor deposition technique that is scalable and easily applicable to industrial sputter deposition systems, in which atoms come to the substrate surface at different angles to form columnar structures. Pt-TF/C powder samples with various types of carbon were produced and studied to investigate their ORR performance. Electrochemical characterization of the samples was performed by cyclic voltammetry and rotating disk electrode measurements. The Pt-TF-to-carbon mass ratios were measured by quartz crystal microbalance and thermogravimetric analysis. X-ray diffraction analysis showed the presence of Pt on the carbon support. Our preliminary results on specific activity, mass activity, and electrochemically active surface area indicate a promising electrocatalyst durability.

Post-deposition annealing effect on the structural and electrical properties of ytterbium oxide as an alternative gate dielectric

The possibility of ytterbium(III) oxide, one of the rare earth oxides, to replace silicon dioxide used as the gate dielectric is discussed in this article. For such a replacement, it is primarily necessary to understand the physical and chemical characteristics of ytterbium(II) oxide as a candidate, such as bond structure, electronic structure, band offsets with Si, dielectric constant, interfacial states and defect behavior. The effects of structural and electrical features of ytterbium(III) oxide-based MOS capacitors on device performance are investigated. The electron beam physical vapor deposition (EBPVD) technique was used for the deposition of ytterbium(III) oxide thin films. The 122 nm thick Yb2O3 thin film was annealed at four different temperatures (200 °C, 400 °C, 600 °C, and 800 °C) in nitrogen environment. The crystallite size determined from the as-deposited sample as 15 nm is the lowest. As expected, crystallite sizes increased as a result of increasing annealing temperature. The presence of Yb2+ oxidation states increased in the region close to the interface or at the interface. The binding energies of the Yb 4d and O 1s spectra increased with increasing depth into the films. In the O 1s spectra, the organic bonds on the surface first decreased and then increased with increasing annealing temperature. Silicate formation at the interface was determined for the annealed samples. This affected the electrical performance of the capacitors. The calculated dielectric values range from 12.1 to 15.8. Interface level densities were found in the order of 1012 cm−2 and it did not exhibit frequency-dependent behavior. The calculated values for the effective charge densities varied between −24.19 × 1011–7.03 × 1011 cm−2. It has been determined that mostly negative charges are trapped more for different capacitors. Finally, Fermi energy level, dopant concentration, diffusion potential and barrier heights were calculated.