We report a combined holographic and nanoimprinting lithography technique toproduce three-dimensional woodpile photonic crystal templates through onlyone single exposure. The interference lithography process uses an integratablediffractive optical element for large throughout 3D pattern manufacturing. Thediffractive optical element consists of two layers of phase grating separated by anintermediate layer, fabricated by repeated nanoimprinting lithography, followed by anSU8 photoresist bonding technique. Grating periods, relative orientation, diffraction angle, andefficiency, as well as layer to layer phase delay, are well designed during manufacturing. Bythermally optimizing the thickness of the intermediate layer, this paper demonstrates thefabrication of interconnected 3D photonic structures with arbitrary symmetry through asingle laser exposure. The two-layer phase mask approach enables a CMOS-compatiblemonolithic integration of 3D photonic structures with other integrated optical elements andwaveguides.
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