Emission mechanism of photons induced by the drain avalanche in Si MOSFET's is discussed by analyzing the emission efficiency (defined by the ratio of the generated photon number to the avalanche-induced carrier number) dependence upon gate and drain voltages, which are found by both photomultiplier measurements and electrical measurements. The dependence are analyzed by using two-dimensional process-device simulator from the point of view of the bias dependence of Iateral (E/sub L/) and vertical (E/sub V/ ) electric fields in the channel near the drain. From the analysis, it is found that the bias dependence of emission efficiency can be explained by considering two-dimensional coexistence change of the avalanche-induced electrons and holes. It is concluded that the emission mechanism is the recombination of the avalanche-induced electrons and holes.
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