The ZnO and Ti:ZnO thin films were deposited on ordinary glass, quartz glass, substrates by sol–gel spin coating. The atomic percent (at.%) of Titanium (Ti) in ZnO is varied from 1 to 6. The deposited thin films were characterized by Grazing Incidence X-ray diffraction (GIXRD) and Raman spectroscopy for structural determination, High - resolution Scanning Electron Microscopy (HRSEM) to determine microstructure and photo degradation studies. The structure of the films is determined by Grazing Incidence X-ray diffraction (GIXRD) and is observed to be Hexagonal wurtzite with (002) orientation. The intensity of (002) decrease with increasing Ti at.%. The grain size is 20 nm and is decreasing to 10 nm with increasing Ti at.%. The HRSEM images of Ti (1%):ZnO and Ti (6%):ZnO thin films reveals that the films were nanocrystalline. The Raman spectrum reveals that the films turn to polycrystalline to nanocrystalline with increasing Ti at.%. The films were shown good response to methylene blue. The fast degradation of methylene blue was observed in case of Ti (1%):ZnO films.