Performance Of High Electron Mobility Transistors Research Articles

Comprehensive empirical modeling of ScAlN/AlGaN/GaN ferroelectric HEMT

This correspondence introduces a concise depiction of a high electron mobility transistor (HEMT) utilizing a model that incorporates the effect of ferroelectric (FE) polarization on the empirical expression for drain current. This is accomplished by modifying the basic Shockley equation (S.E) for MESFET. The model employed in this investigation is particularly geared towards investigating the impact of the counterclockwise hysteresis effect due to the use of dielectric ScAlN on the transfer characteristics ( Id−Vgs ), which is mainly attributed to trapping and de-trapping of charge carriers at the dielectric/semiconductor interface. Modifying the S.E. made it possible to replicate the behavior observed in experimental HEMT accurately. We reported the modified drain current empirical expressions for the ScAlN/AlGaN/GaN HEMT that considers the FE polarization. The results of this study showed good agreement between the Id−Vgs characteristics obtained from the analytical and experimental data, with a root mean square deviation (RMSD) error of 0.97% and a mean squared error error of 0.94%. This analytical drain current model, presented herein for the first time, incorporates a limited number of fitting parameters. Therefore, enhancing the computational efficiency to assess the performance of FE GaN HEMTs for usage in wide-area electronics.

GaN HEMT for High-performance Applications: A Revolutionary Technology

Background: The upsurge in the field of radio frequency power electronics has led to the involvement of wide bandgap semiconductor materials because of their potential characteristics in achieving high breakdown voltage, output power density, and frequency. III-V group materials of the periodic table have proven to be the best candidates for achieving this goal. Among all the available combinations of group III-V semiconductor materials, gallium nitride (GaN), having a band gap of 3.4eV, has gradually started gaining the confidence to become the next-generation material to fulfill these requirements. Objective: Considering the various advantages provided by GaN, it is widely used in AlGaN/GaN HEMTs (High Electron Mobility Transistors) as their fundamental materials. This work aimed to review the structure, operation, and polarization mechanisms influencing the HEMT device, different types of GaN HEMT, and the various process technologies for developing the device. Methods: Various available methods to obtain an enhancement type GaN HEMT are discussed in the study. It also covers the recent developments and various techniques to improve the performance and device linearity of GaN HEMT. Conclusion: Despite the advantages and continuous improvement exhibited by the GaN HEMT technology, it faces several reliability issues, leading to degradation of device performance. In this study, we review various reliability issues and ways to mitigate them. Moreover, several application domains are also discussed, where GaN HEMTs have proven their capability. It also focuses on reviewing and compiling the various aspects related to the GaN HEMT, thus providing all necessary information.

Two-temperature principle for evaluating electrothermal performance of GaN HEMTs

Self-heating effects in Gallium nitride (GaN) high-electron-mobility transistors (HEMTs) can adversely impact both device reliability and electrical performance. Despite this, a holistic understanding of the relationship among heat transport mechanisms, device reliability, and degradation of electrical performance has yet to be established. This Letter presents an in-depth analysis of self-heating effects in GaN HEMTs using technology computer-aided design and phonon Monte Carlo simulations. We examine the differential behaviors of the maximum channel temperature (Tmax) and the equivalent channel temperature (Teq) in response to non-Fourier heat spreading processes, highlighting their respective dependencies on bias conditions and phonon ballistic effects. Our study reveals that Tmax, a crucial metric for device reliability, is highly sensitive to both heat source-related and cross-plane ballistic effects, especially in the saturation regime. In contrast, Teq, which correlates with drain current degradation, shows minimal bias dependence and is predominantly influenced by the cross-plane ballistic effect. These findings emphasize the importance of optimizing device designs to mitigate both Tmax and Teq, with a particular focus on thermal designs influenced by the heat source size. This work contributes to a deeper understanding of self-heating phenomena in GaN HEMTs and provides valuable insights for enhancing device performance and reliability.

Reducing proton radiation vulnerability in AlGaN/GaN high electron mobility transistors with residual strain relief

Strain plays an important role in the performance and reliability of AlGaN/GaN high electron mobility transistors (HEMTs). However, the impact of strain on the performance of proton irradiated GaN HEMTs is yet unknown. In this study, we investigated the effects of strain relaxation on the properties of proton irradiated AlGaN/GaN HEMTs. Controlled strain relief is achieved locally using the substrate micro-trench technique. The strain relieved devices experienced a relatively smaller increase of strain after 5 MeV proton irradiation at a fluence of 5 × 1014 cm−2 compared to the non-strain relieved devices, i.e., the pristine devices. After proton irradiation, both pristine and strain relieved devices demonstrate a reduction of drain saturation current (Ids,sat), maximum transconductance (Gm), carrier density (ns), and mobility (μn). Depending on the bias conditions the pristine devices exhibit up to 32% reduction of Ids,sat, 38% reduction of Gm, 15% reduction of ns, and 48% reduction of μn values. In contrast, the strain relieved devices show only up to 13% reduction of Ids,sat, 11% reduction of Gm, 9% reduction of ns, and 30% reduction of μn values. In addition, the locally strain relieved devices show smaller positive shift of threshold voltage compared to the pristine devices after proton irradiation. The less detrimental impact of proton irradiation on the transport properties of strain relieved devices could be attributed to reduced point defect density producing lower trap center densities, and evolution of lower operation related stresses due to lower initial residual strain.

Design and Simulation of Enhancement-Mode Vertical Superjunction GaN HEMT with Improved Ron and Cut-Off Frequency

GaN-based vertical superjunction high electron mobility transistors (HEMT) are recent avenues for power transistors. In this work, an enhancement mode vertical superjunction GaN-HEMT with gradient doping (GDP-SJ HEMT) is proposed and analyzed. In the GDP-SJ HEMT, the n-pillar doping concentration increases in a gradient manner from top to bottom. Whereas the concentration of the p-pillar is uniform and equivalent to the doping of the middle of the n-pillar. By optimizing the device design and doping profile, the specific-on resistance (Ron,sp) of the device has been reduced from 5.0 mΩ-cm2 to 3.79 mΩ-cm2. To the best of our knowledge, the frequency performance of vertical SJ HEMT has not been documented in the literature. As a result, we also performed a frequency study. The cut-off frequency (f T) of the proposed device is 78 MHz and the maximum frequency (f MAX) is 71 MHz. The device optimization increases the f T by 89% i.e. 148 MHz and f MAX by 67% i.e. 119 MHz.

Research Progress in Capping Diamond Growth on GaN HEMT: A Review

With the increased power density of gallium nitride (GaN) high electron mobility transistors (HEMTs), effective cooling is required to eliminate the self-heating effect. Incorporating diamond into GaN HEMT is an alternative way to dissipate the heat generated from the active region. In this review, the four main approaches for the integration of diamond and GaN are briefly reviewed, including bonding the GaN wafer and diamond wafer together, depositing diamond as a heat-dissipation layer on the GaN epitaxial layer or HEMTs, and the epitaxial growth of GaN on the diamond substrate. Due to the large lattice mismatch and thermal mismatch, as well as the crystal structure differences between diamond and GaN, all above works face some problems and challenges. Moreover, the review is focused on the state-of-art of polycrystalline or nanocrystalline diamond (NCD) passivation layers on the topside of GaN HEMTs, including the nucleation and growth of the diamond on GaN HEMTs, structure and interface analysis, and thermal characterization, as well as electrical performance of GaN HEMTs after diamond film growth. Upon comparing three different nucleation methods of diamond on GaN, electrostatic seeding is the most commonly used pretreatment method to enhance the nucleation density. NCDs are usually grown at lower temperatures (600–800 °C) on GaN HEMTs, and the methods of “gate after growth” and selective area growth are emphasized. The influence of interface quality on the heat dissipation of capped diamond on GaN is analyzed. We consider that effectively reducing the thermal boundary resistance, improving the regional quality at the interface, and optimizing the stress–strain state are needed to improve the heat-spreading performance and stability of GaN HEMTs. NCD-capped GaN HEMTs exhibit more than a 20% lower operating temperature, and the current density is also improved, which shows good application potential. Furthermore, the existing problems and challenges have also been discussed. The nucleation and growth characteristics of diamond itself and the integration of diamond and GaN HEMT are discussed together, which can more completely explain the thermal diffusion effect of diamond for GaN HEMT and the corresponding technical problems.

Epitaxial κ-Ga2O3/GaN heterostructure for high electron-mobility transistors

GaN power technology, especially AlGaN/GaN high electron-mobility transistors (HEMTs), has made significant progress in recent years. However, the performance of HEMTs is still limited due to a trade-off between on-resistance and off-state breakdown voltage (BV). Integrating a polar gate dielectric with GaN HEMTs can potentially improve both sheet resistance of the two-dimensional electron gas channel and the field distribution between gate and drain. In this regard, orthorhombic κ-Ga2O3 has attractive properties since it is predicted to be strongly polar and highly dielectric while it grows epitaxially on GaN. By successfully integrating crystalline κ-Ga2O3 on GaN HEMTs, the channel sheet resistance is reduced by 20% from a reference device with amorphous Al2O3 gate dielectric. As a result, the cut-off frequency increases from 4.8 to 9.1 GHz. The dielectric property of κ-Ga2O3 also improves BV from 354 to 380 V by reducing the peak electric field in the gate-drain region.

Effect of the plasma experimental parameters on the dose and profiles of hydrogen in-diffused into the GaN/AlGaN/GaN/Si high electron mobility transistor

The structures of electronic devices based on GaN and its AlGaN alloys grown on foreign substrates, display a high threading dislocations concentration (TDs); 107–1011 cm-2, introducing deffects diminishing the devices predicted performances. The High Electron Mobility Transistor (HEMT) core is constituted by an AlGaN/GaN heterojunction, where the AlGaN layer, of nanometric dimensions, results on the formation of the high mobility-two-dimensional electron gas (TEG). The TEG performance might be improved by its hydrogenation, although the process can, as well, catastrophically degrade the device. Here is presented a detailed study of the effect of the hydrogenation experimental parameters: plasma power, sample temperature and duration, on its dose and distribution throughout the structure. This study found that the dose depends on the square of the plasma power, increases linearly on the hydrogenation time and slightly proportional to the sample temperature. These results shed light on how to improve the AlGaN/GaN HEMT performance.

The effect of post-metal annealing on DC and RF performance of AlGaN/GaN HEMT

The effects of gate post-metal annealing (PMA) on the DC and RF characteristics of AlGaN/GaN high-electron-mobility transistors (HEMTs) were investigated. The unannealed and post gate-metal annealed AlGaN/GaN HEMTs were fully fabricated using NANOTAM’s 0.5 μm gate length technology. PMA was performed at 450 °C for 10 min in nitrogen ambient for one of the wafers. The main focus was the effect of PMA on the electrical performance of HEMTs, including gate resistivity, transconductance, small-signal gain, output power (Pout), and threshold voltage (Vth) shift. It is achieved that HEMT with PMA has a gain of 18.5 dB, while HEMT without PMA shows a small-signal gain of 21.8 dB, as the PMA process increases the gate resistance (Rg) and decreases the transconductance (gm). The large-signal performance of the sample with PMA is better than the one without PMA, having an increase of 1.4 W/mm in Po ut from 20.9 W to 24.4 W. The transistor with PMA also demonstrates a reliable gate performance and stable Vth, and the wafer exhibits better uniformity.

(Invited, Digital Presentation) The Challenges of Overcoming Defects in GaN Hemts for Operation in Extreme Environments

GaN high electron mobility transistors (HEMTs) are known to contain a high density of crystal defects. The material properties of GaN such as high breakdown voltage, carrier mobility, critical electric field strength, and higher thermal conductivity than Si, make it an ideal candidate material for use in power switches in extreme environments. In high power environments (>1.5kV), vertical GaN device geometry is emerging as an effective technique to improve performance, but the more mature lateral GaN HEMT technology is being consistently improved upon to increase breakdown voltage and overall performance in the high-power regime. In high temperature environments, GaNs wide bandgap helps in preventing unwanted thermal generation of carriers, but devices also experience increased gate-leakage current and ohmic contact resistance degradation at high temperatures. The role of defects in these limiting factors of GaN HEMT performance in extreme high power and high temperature environments is reviewed.

Self-heating of cryogenic high electron-mobility transistor amplifiers and the limits of microwave noise performance

The fundamental limits of the microwave noise performance of high electron-mobility transistors (HEMTs) are of scientific and practical interest for applications in radio astronomy and quantum computing. Self-heating at cryogenic temperatures has been reported to be a limiting mechanism for the noise, but cryogenic cooling strategies to mitigate it, for instance, using liquid cryogens, have not been evaluated. Here, we report microwave noise measurements of a packaged two-stage amplifier with GaAs metamorphic HEMTs immersed in normal and superfluid 4He baths and in vacuum from 1.6 to 80 K. We find that these liquid cryogens are unable to mitigate the thermal noise associated with self-heating. Considering this finding, we examine the implications for the lower bounds of cryogenic noise performance in HEMTs. Our analysis supports the general design principle for cryogenic HEMTs of maximizing gain at the lowest possible power.

DC and RF performance of lateral AlGaN/GaN FinFET with ultrathin gate dielectric

In this study, an enhancement-mode (E-mode) GaN high electron mobility transistor (HEMT) with lateral tri-gate structure field effect transistor (FinFET) is proposed. To passivate the fin width, while keeping the normally-off performance of the FinFET intact, an ultrathin aluminium-oxide/sapphire (Al2O3) gate dielectric is proposed (in a basic single-finger 0.125 mm device). Later, the DC and radio frequency (RF) performances of the proposed FinFET designs (with optimized fin width and Al2O3 thickness) are compared with that of conventional planar HEMT. DC and RF measurements are performed using power transistors in ten-fingers configuration, with a total gate periphery of 2.5 mm. The effect of Fin structure and Al2O3 thickness on the electrical performance of HEMTs, including threshold voltage (V th) shift, transconductance (g m) linearity, small-signal gain, cut off frequency (f t), output power (P out), and power-added efficiency (PAE) are investigated. Based on our findings, FinFET configuration imposes normally-off functionality with a V, while the planar architecture has a V. Originating from passivation property of the alumina layer, the FinFET design exhibits two orders of magnitude smaller drain and gate leakage currents compared to the planar case. Moreover, large signal RF measurements reveals an improved P out density by over 50% compared to planar device, attributed to reduced thermal resistance in FinFETs stemming from additional lateral heat spreading of sidewall gates. Owing to its superior DC and RF performance, the proposed FinFET design with ultrathin gate dielectric could bear the potential of reliable operating for microwave power applications, by further scaling of the gate length.

Characterization of trap states in AlN/GaN superlattice channel high electron mobility transistors under total-ionizing-dose with 60Co γ-irradiation

In this Letter, the effects of trap states in AlN/GaN superlattice channel HEMTs (high electron mobility transistors) under total ionizing dose with γ-irradiation have been systematically investigated. After 1 Mrad γ-irradiation with a dose rate of 50 rad/s, negative drifts in threshold voltage and C–V characteristics are observed. Simultaneously, the two-dimensional electron gas sheet density of the upper channel increases from 5.09 × 1012 to 5.47 × 1012 cm−2, while that of the lower channel decreases from 4.41 × 1012 to 3.86 × 1012 cm−2, respectively. Furthermore, frequency-dependent capacitance and conductance measurements are adopted to investigate the evolution of trap states in an electron channel. The trap state density (DT = 0.21–0.88 × 1013 cm−2 eV−1) is over the ET range from 0.314 to 0.329 eV after irradiation for the upper channel, while the trap state in the lower channel decreases from 4.54 × 1011 cm−2 eV−1 at ET = 0.230 eV to 2.38 × 1011 cm−2 eV−1 at ET = 0.278 eV. The density (1.39–1.54 × 1011 cm−2 eV−1) of trap states with faster τT (0.033–0.037 μs) generated in a lower channel is located at shallower ET between 0.227 and 0.230 eV. The results reveal the mechanism of trap states in the channel, affecting the performance of HEMTs, which can provide a valuable understanding for hardening in space radiation.

GaN HEMTs on low resistivity Si substrates with thick buffer layers for RF signal amplification and power conversion

We report GaN high-electron-mobility transistors (HEMTs) with a thick (7.7 µm) GaN buffer on a Czochralski low resistivity Si (LRS) substrate. The GaN HEMTs exhibit high performance for both radio-frequency (RF) amplification and power conversion. The thick GaN buffer was grown by means of vacancy engineering, delivering a low dislocation density of ∼1.6 × 108 cm−2, contributing to suppressed RF signal coupling to the lossy Si substrate and a high vertical voltage blocking capability. For RF performance, GaN HEMTs with a 650 nm gate exhibit an fT/fMAX value of 25.1/32.3 GHz and a maximum output power POUT of 2.2 W/mm at 4 GHz with a drain voltage VDS of 20 V, which is comparable with the performance of RF GaN HEMTs on a high-resistivity silicon substrate without the existence of the field plate. For power performance, the vertical breakdown voltage of the wafer is 1160 V, and the three-terminal lateral breakdown voltage is 885 V in a GaN HEMT with a gate-to-drain distance of 8 µm. The thick GaN layer on the LRS substrate scheme thus provides a compelling platform for monolithic integration of high-performance RF devices and high-voltage power devices.

Improved X-Band Performance and Reliability of a GaN HEMT With Sunken Source Connected Field Plate Design

The world class performance and reliability of a high-power density AlGaN/GaN high electron mobility transistor (HEMT) with an innovative sunken source connected field plate (SCFP) is reported. The optimized HEMT structure implements a novel sunken SCFP design that has significant advantages over the conventional field plated GaN HEMT. The new design reduced parasitic capacitances (C_gs and C_gd) whilst suppressing the peak electric fields in the drift region to improve breakdown voltage and reliability. This sunken SCFP demonstrates the improved RF performance and reliability with respect to leading GaN HEMT devices for x-band applications. The fabricated device produces 10 GHz performance with saturated output power >10 W/mm, linear gain >18 dB and PAE > 60% @ 50 V. The improved gain is a direct result of the reduction in Cgs and Cgd, by 15% and 60%, respectively. The increased power is achieved from lower trapping and increased drain voltage rating of 25%. Accelerated RF-driven reliability testing is shown to determine the expected lifetime of the device was >6E7 hours at 225°C junction temperature. This is a more than 2 orders of magnitude increase over the conventional field plate design.

Temperature and Gate-Length Dependence of Subthreshold RF Detection in GaN HEMTs.

The responsivity of AlGaN/GaN high-electron mobility transistors (HEMTs) when operating as zero-bias RF detectors in the subthreshold regime exhibits different behaviors depending on the operating temperature and gate length of the transistors. We have characterized in temperature (8–400 K) the detection performance of HEMTs with different gate lengths (75–250 nm). The detection results at 1 GHz can be reproduced by a quasi-static model, which allows us to interpret them by inspection of the output − curves of the transistors. We explain the different behaviors observed in terms of the presence or absence of a shift in the zero-current operating point originating from the existence of the gate-leakage current jointly with temperature effects related to the ionization of bulk traps.

8.7 W/mm output power density and 42% power-added-efficiency at 30 GHz for AlGaN/GaN HEMTs using Si-rich SiN passivation interlayer

In this work, high-performance millimeter-wave AlGaN/GaN structures for high-electron-mobility transistors (HEMTs) are presented using a Si-rich SiN passivation layer. The analysis of transient and x-ray photoelectron spectroscopy measurements revealed that the presence of the Si-rich SiN layer leads to a decrease in the deep-level surface traps by mitigating the formation of Ga–O bonds. This results in a suppressed current collapse from 11% to 5% as well as a decreased knee voltage (Vknee). The current gain cutoff frequency and the maximum oscillation frequency of the devices with the Si-rich SiN layer exhibit the values of 74 and 140 GHz, respectively. Moreover, load-pull measurements at 30 GHz show that the devices containing the Si-rich SiN deliver excellent output power density of 8.7 W/mm at Vds = 28 V and high power-added efficiency up to 48% at Vds = 10 V. The enhanced power performance of HEMTs using Si-rich SiN interlayer passivation is attributed to the reduced Vknee, the suppressed current collapse, and the improved drain current.

Impact of in situ NH3 pre-treatment of LPCVD SiN passivation on GaN HEMT performance

The impact on the performance of GaN high electron mobility transistors (HEMTs) of in situ ammonia (NH3) pre-treatment prior to the deposition of silicon nitride (SiN) passivation with low-pressure chemical vapor deposition (LPCVD ) is investigated. Three different NH3 pre-treatment durations (0, 3, and 10 min) were compared in terms of interface properties and device performance. A reduction of oxygen (O) at the interface between SiN and epi-structure is detected by scanning transmission electron microscopy (STEM )-electron energy loss spectroscopy (EELS) measurements in the sample subjected to 10 min of pre-treatment. The samples subjected to NH3 pre-treatment show a reduced surface-related current dispersion of 9% (compared to 16% for the untreated sample), which is attributed to the reduction of O at the SiN/epi interface. Furthermore, NH3 pre-treatment for 10 min significantly improves the current dispersion uniformity from 14.5% to 1.9%. The reduced trapping effects result in a high output power of 3.4 W mm−1 at 3 GHz (compared to 2.6 W mm−1 for the untreated sample). These results demonstrate that the in situ NH3 pre-treatment before LPCVD of SiN passivation is critical and can effectively improves the large-signal microwave performance of GaN HEMTs.

A cost-effective technology to improve power performance of nanoribbons GaN HEMTs

A cost-effective fabrication process is developed to improve the power performance of AlGaN/GaN High Electron Mobility Transistors (HEMTs). This process uses nitrogen ion (N+) implantation to form multiple parallel nanoribbons on AlGaN/GaN heterostructures, with a thin buffer layer (AlGaN/GaN NR-HEMTs). The stopping and range of ions in matter simulations of the N+ implantation combined with measured current-field characteristics reveal a good electrical isolation beneath the two-dimensional electron gas, resulting in substantial increase in the breakdown field of the NR-HEMTs, when compared to conventional AlGaN/GaN HEMTs. The fabricated AlGaN/GaN NR-HEMTs performed (i) an ON/OFF current ratio more than two orders of magnitude larger and (ii) a buffer leakage current more than one order of magnitude weaker than that of the conventional AlGaN/GaN HEMTs. The on-resistance, RON, and series resistance, RS, of AlGaN/GaN NR-HEMTs are both reduced by one order of magnitude when compared to those of the conventional AlGaN/GaN HEMTs. These have boosted the drive current density by up to 435%. Furthermore, we have found that the architecture of the AlGaN/GaN NR-HEMTs reduces the destructive impact of electron traps in the device. An optimized AlGaN/GaN NR-HEMT exhibited a better electrostatic integrity, a subthreshold slope of ∼210 mV/dec instead of 730 mV/dec for a conventional GaN HEMT. A higher linearity in the transconductance, gm, of NR-HEMTs is observed, twice of that of a conventional GaN HEMT. These results demonstrate the great interest of developed process technology of NR-HEMTs for high-power switching applications.

Study of Normally-Off AlGaN/GaN HEMT with Microfield Plate for Improvement of Breakdown Voltage.

In this paper, we introduce a new type of AlGaN/GaN high electron mobility transistor (HEMT) with microfield plate (FP). We use Silvaco-ATLAS two-dimensional numerical simulation to calculate the performance of conventional HEMT and HEMT with micro-FP and analyze its principle. By studying a new charge balance method provided by HEMTs and micro-FPs, the physical mechanism of FP adjusting the HEMT potential distribution and channel electric field distribution is analyzed. The new FP structure consists of a drain field plate (D-FP), a source field plate (S-FP) and several micro-gate field plates (G-FP) to improve the output characteristics of HEMTs. By adjusting the distribution of potential and channel electric field, a wider and more uniform channel electric field can be obtained, and the breakdown voltage can be increased to 1278 V. Although the on-resistance of the HEMT is slightly increased to 5.24 mm, it is still lower than other reference values. These results may open up a new and effective method for manufacturing high-power devices for power electronics applications.