We have measured the frequency dependence of the individual photoelastic coefficients of silicon using a simplified acousto-optic technique. We define the photoelastic tensor $q$ by $\ensuremath{\Delta}{\ensuremath{\epsilon}}_{\mathrm{ij}}={q}_{\mathrm{ijkl}}{e}_{\mathrm{kl}}$, where $e$ is the particle displacement gradient tensor and $\ensuremath{\Delta}\ensuremath{\epsilon}$ is the strain-induced change in the optical dielectric tensor. We find ${q}_{1111}(3.39 \ensuremath{\mu}m)=+13.0\ifmmode\pm\else\textpm\fi{}0.6$, ${q}_{1111}(1.15 \ensuremath{\mu}m)=+15.7\ifmmode\pm\else\textpm\fi{}1.1$, ${q}_{1122}(3.39 \ensuremath{\mu}m)=\ensuremath{-}2.41\ifmmode\pm\else\textpm\fi{}0.1$, and ${q}_{1122}(1.15 \ensuremath{\mu}m)=\ensuremath{-}1.45\ifmmode\pm\else\textpm\fi{}0.1$. The extrapolated long-wavelength limit of the average photoelastic coefficient agrees well with our previous estimate for the frequency-independent Phillips---Van Vechten model. However, within a proper frequency-dependent Penn model we have shown that the oscillator strength does not vary as ${r}^{\ensuremath{-}3}$. Further we have demonstrated that the dispersion energy ${E}_{d}$ in the Wemple-DiDomenico model is proportional to ${r}^{\ensuremath{-}1.9\ifmmode\pm\else\textpm\fi{}0.8}$ and not volume independent as would be expected from the model. It is concluded that whereas a simple single-gap model works well to describe the low-frequency dispersion in the dielectric constant of silicon, it is incapable of describing the dispersion in the photoelastic tensor.
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