The adsorption of NO and its reaction with H 2 over polycrystalline Pd were investigated using flash desorption technique and ultraviolet photoelectron spectroscopy under 10 −5 Pa pressure range of reactants and surface temperatures between 300 and 900 K. NO was adsorbed dissociatively onto the Pd surface above 500 K, and the heat of dissociative adsorption was ca. 126 kJ/mol. Atomic nitrogen was observed to accumulate on the Pd surface during the NO-H 2 reaction, whose desorption rate exhibited second order kinetics and is expressed as follows: V d = 10 −9.8 ± 0.3 exp(−67( kJ/ mol)/ RT) (cm 2/atom·s). Hydrogenation of the adsorbed nitrogen proceeded rapidly at 485 K. It was confirmed from these results that formation of N 2 and NH 3 in the NO-H 2 reaction proceeds through this atomically adsorbed nitrogen. Pd-N bond energy and enthalpies of some intermediate states of the NO-H 2 reaction were estimated.
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