We report on the processing and characterization of microstrip sensors and pad detectors produced on n- and p-type Magnetic Czochralski (MCz), Epitaxial (EPI) and Float Zone (FZ) silicon within the SMART project to develop radiation-hard silicon position sensitive detectors for future colliders. Each wafer contains 10 microstrip sensors with different geometries, several diodes and test structures. The isolation in the strip detectors produced on p-type material has been achieved by means of a uniform p-spray implantation, with doping of 3×10 12 cm −2 (low-dose p-spray) and 5×10 12 cm −2 (high-dose p-spray). The samples have undergone irradiations with 26 MeV protons and reactor neutrons up to ∼10 16 cm −2 1 MeV equivalent neutrons (n eq/cm 2), and have been completely characterized before and after irradiation in terms of leakage current, depletion voltage and breakdown voltage. The current damage parameter α has been determined for all substrates. MCz diodes show less pronounced dependence of effective doping concentration N eff on the fluence when compared to standard FZ silicon, giving results comparable to diffusion oxygenated FZ devices for all irradiation sources. The observed increase of N eff with fluence can be interpreted in EPI material as a net donor introduction process, overcompensating the usual acceptor introduction process. This effect is stronger for 26 MeV proton irradiation than for neutron irradiation.
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